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Machine translation
1. (WO2005103325) A METHOD FOR PROCESSING A SUBSTRATE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/103325    International Application No.:    PCT/US2005/004905
Publication Date: 03.11.2005 International Filing Date: 15.02.2005
IPC:
C23C 16/16 (2006.01), C23C 16/458 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; TBS Broadcast Center, 3-6 Akasaka 5-chome, Minato-ku, Tokyo 107 (JP) (For All Designated States Except US).
INTERNATIONAL BUSINESS MACHINES CORPORATION [US/US]; New Orchard Road, Armonk, NY 10504 (US) (For All Designated States Except US).
NAKAMURA, Kazuhito [JP/US]; (US) (For US Only).
WAJDA, Cory [US/US]; (US) (For US Only).
MOSCA, Enrico [US/US]; (US) (For US Only).
LEUSINK, Gert [NL/US]; (US) (For US Only).
MCFEELY, Fenton, R. [US/US]; (US) (For US Only).
KAWANO, Yumiko [JP/JP]; (JP) (For US Only).
MALHOTRA, Sandra, G. [US/US]; (US) (For US Only)
Inventors: NAKAMURA, Kazuhito; (US).
WAJDA, Cory; (US).
MOSCA, Enrico; (US).
LEUSINK, Gert; (US).
MCFEELY, Fenton, R.; (US).
KAWANO, Yumiko; (JP).
MALHOTRA, Sandra, G.; (US)
Agent: FREI, Donald, F.; Wood, Herron & Evans, L.L.P., 2700 Carew Tower, Cincinnati, OH 45202 (US)
Priority Data:
10/814,768 31.03.2004 US
Title (EN) A METHOD FOR PROCESSING A SUBSTRATE
(FR) PROCEDE PERMETTANT DE TRAITER UN SUBSTRAT
Abstract: front page image
(EN)A method for processing a substrate (25, 620, 720) on a ceramic substrate heater (20, 600, 700) in a process chamber (10). The method includes forming a protective coating (730, 790) on the ceramic substrate heater (20, 600, 700) in the process chamber (10) and processing a substrate (25, 620, 720) on the coated substrate heater. The processing can include providing a substrate (25, 620, 720) to be processed on the coated ceramic substrate heater, performing a process on the substrate (25, 620, 720) by exposing the substrate (25, 620, 720) to a process gas, and removing the processed substrate from the process chamber (10).
(FR)La présente invention concerne un procédé permettant de traiter un substrat (25, 620, 720) sur un dispositif de chauffage de substrat en céramique (20, 600, 700) dans une chambre de traitement (10). Le procédé décrit dans cette invention consiste à former un revêtement protecteur (730, 790) sur le dispositif de chauffage de substrat en céramique (20, 600, 700) dans la chambre de traitement (10), puis à traiter un substrat (25, 620, 720) sur le dispositif de chauffage de substrat enrobé. Le traitement consiste à placer un substrat (25, 620, 720) devant être traité sur le dispositif de chauffage de substrat en céramique enrobé, à exécuter un traitement sur le substrat (25, 620, 720) en exposant ledit substrat (25, 620, 720) à un gaz de traitement, puis à retirer le substrat traité de la chambre de traitement (10).
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)