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1. (WO2005087974) CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/087974 International Application No.: PCT/US2005/005855
Publication Date: 22.09.2005 International Filing Date: 24.02.2005
IPC:
C23C 16/505 (2006.01)
C CHEMISTRY; METALLURGY
23
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
C
COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
16
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition (CVD) processes
44
characterised by the method of coating
50
using electric discharges
505
using radio frequency discharges
Applicants:
SEAMONS, Martin Jay [US/US]; US (UsOnly)
YEH, Wendy H. [US/US]; US (UsOnly)
RATHI, Sudha S.R. [US/US]; US (UsOnly)
PADHI, Deenesh [IN/US]; US (UsOnly)
LUAN, Andy (Hsin Chiao); US (UsOnly)
TANG, Sum-Yee Betty; US (UsOnly)
KULKARNI, Priya [IN/US]; US (UsOnly)
SIVARAMAKRISHNAN, Visweswaren [US/US]; US (UsOnly)
KIM, Bok Hoen [KR/US]; US (UsOnly)
M'SAAD, Hichem [TN/US]; US (UsOnly)
WANG, Yuxiang May [CN/US]; US (UsOnly)
KWAN, Michael Chiu [US/US]; US (UsOnly)
APPLIED MATERIALS, INC. [US/US]; 3050 Bowers Ave Santa Clara, CA 95054, US (AllExceptUS)
Inventors:
SEAMONS, Martin Jay; US
YEH, Wendy H.; US
RATHI, Sudha S.R.; US
PADHI, Deenesh; US
LUAN, Andy (Hsin Chiao); US
TANG, Sum-Yee Betty; US
KULKARNI, Priya; US
SIVARAMAKRISHNAN, Visweswaren; US
KIM, Bok Hoen; US
M'SAAD, Hichem; US
WANG, Yuxiang May; US
KWAN, Michael Chiu; US
Agent:
PATTERSON, B. Todd ; MOSER, PATTERSON & SHERIDAN, LLP 3040 Post Oak Blvd., Suite 1500 Houston, TX 77056-6582, US
Priority Data:
10/799,14612.03.2004US
60/550,38605.03.2004US
60/565,63926.04.2004US
60/649,34402.02.2005US
Title (EN) CVD PROCESSES FOR THE DEPOSITION OF AMORPHOUS CARBON FILMS
(FR) PRÉCURSEURS LIQUIDES POUR LE DÉPÔT CVD DE FILMS DE CARBONE AMORPHE
Abstract:
(EN) Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.
(FR) La présente invention concerne des procédés de dépôt de matières à base de carbone. Selon un aspect, cette invention concerne un procédé de traitement d'un substrat qui consiste à positionner le substrat dans une chambre de traitement, à introduire un gaz de traitement dans la chambre de traitement, ledit gaz de traitement renfermant un gaz vecteur, de l'hydrogène et au moins un composé précurseur, à générer un plasma du gaz de traitement par application de puissance provenant d'une source RF double fréquence et à déposer une couche de carbone amorphe sur le substrat.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)