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1. (WO2005069075) PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/069075    International Application No.:    PCT/JP2004/018832
Publication Date: 28.07.2005 International Filing Date: 16.12.2004
IPC:
C08G 69/26 (2006.01), G03F 7/004 (2006.01), G03F 7/037 (2006.01), G03F 7/039 (2006.01), H01L 21/027 (2006.01)
Applicants: Hitachi Chemical DuPont Microsystems Ltd. [JP/JP]; 4-1, Koishikawa 1-chome, Bunkyou-ku, Tokyo 1120002 (JP) (For All Designated States Except US).
OOE, Masayuki [JP/JP]; (JP) (For US Only).
KOMATSU, Hiroshi [JP/JP]; (JP) (For US Only).
TSUMARU, Yoshiko [JP/JP]; (JP) (For US Only).
KAWASAKI, Dai [JP/JP]; (JP) (For US Only).
KATOU, Kouji [JP/JP]; (JP) (For US Only).
UENO, Takumi [JP/JP]; (JP) (For US Only)
Inventors: OOE, Masayuki; (JP).
KOMATSU, Hiroshi; (JP).
TSUMARU, Yoshiko; (JP).
KAWASAKI, Dai; (JP).
KATOU, Kouji; (JP).
UENO, Takumi; (JP)
Agent: SAKAI, Hiroaki; Sakai International Patent Office Kasumigaseki Building 2-5, Kasumigaseki 3-chome Chiyoda-ku, Tokyo 100-6019 (JP)
Priority Data:
2004-006715 14.01.2004 JP
Title (EN) PHOTOSENSITIVE POLYMER COMPOSITION, PROCESS FOR PRODUCING PATTERN, AND ELECTRONIC PART
(FR) COMPOSITION POLYMERE PHOTOSENSIBLE, PROCEDE POUR GENERER UN MOTIF ET COMPOSANT ELECTRONIQUE
(JA) 感光性重合体組成物、パターンの製造法及び電子部品
Abstract: front page image
(EN)A photosensitive polymer composition which comprises (a) a polyamide having repeating units represented by the following general formula (I): [Chemical formula (1)] (wherein U represents a tetravalent organic group; V represents a divalent organic group; and p is an integer indicating the number of the repeating units), (b) a compound which generates an acid by the action of light, and (c) a compound represented by the following general formula (II): [Chemical formula 2] (wherein m and n each independently is 1 or 2; R's each independently represents hydrogen, alkyl, or acyl; and R1 and R2 each independently represents C1-3 fluoroalkyl).
(FR)L'invention concerne une composition polymère photosensible comportant (a) un polyamide présentant des unités récurrentes de formule générale (I): où U représente un groupe organique tétravalent, V représente un groupe organique divalent, p est un entier représentant le nombre d'unités récurrentes, (b) un composé créant un acide sous l'action de la lumière et (c) un composé de formule générale (II): où m et n sont chacun indépendamment 1 ou 2; tous les R représentent chacun indépendamment hydrogène, alkyle ou acyle et R<sp>1</sp> et R<sp>2</sp> représentent chacun indépendamment C<sb>1-3</sb> fluoroalkyle.
(JA) 感光性重合体組成物を(a)一般式(I) 【化1】 (式中、Uは4価の有機基を示し、Vは2価の有機基を示す。pは繰り返し単位数を表す整数である。)で表される繰り返し単位を有するポリアミド、(b)光により酸を発生する化合物、および、(c)一般式(II) 【化2】 (式中、m及びnは各々独立に1か2の整数であり、Rは各々独立に水素、アルキル基又はアシル基であり、R1及びR2は各々独立に炭素数1~3のフルオロアルキル基を示す。)で表される化合物を含有して構成する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)