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Pub. No.:    WO/2005/066240    International Application No.:    PCT/US2004/044035
Publication Date: 21.07.2005 International Filing Date: 30.12.2004
C09D 179/08 (2006.01)
Applicants: ROHM AND HAAS ELECTRONIC MATERIALS LLC [US/US]; 455 Forest Street, Marlborough, MA 01752 (US) (For All Designated States Except US).
GOFF, David, L. [US/US]; (US) (For US Only).
MATTHEWS, J., Ioan [GB/US]; (US) (For US Only).
YUN, Hao [--/--]; (US) (For US Only).
TREFONAS, Peter [US/US]; (US) (For US Only).
CHO, Sungseo [KR/US]; (US) (For US Only)
Inventors: GOFF, David, L.; (US).
MATTHEWS, J., Ioan; (US).
YUN, Hao; (US).
TREFONAS, Peter; (US).
CHO, Sungseo; (US)
Agent: CORLESS, Peter, F.,; Edwards & Angell, LLP, P.O. Box 55874, Boston, MA 02205 (US)
Priority Data:
60/533,614 30.12.2003 US
Abstract: front page image
(EN)Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition (“ARC”) employed with an overcoated photoresist layer in the manufacture of microelectronic wafers and other electronic devices.
(FR)L'invention concerne des compositions antiréfléchissantes qui comprennent un composant qui se présente comme un produit de matériaux comprenant une amine et un anhydride et/ou un dérivé d'anhydride. Les compositions de l'invention sont particulièrement utiles en tant que compositions de revêtement antiréfléchissantes ( ARC ) utilisée avec une couche de photorésine superposée dans la fabrication de tranches micro-électroniques et d'autres dispositifs électroniques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)