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1. WO2005066090 - SILICA GLASS

Publication Number WO/2005/066090
Publication Date 21.07.2005
International Application No. PCT/JP2004/019834
International Filing Date 28.12.2004
IPC
C03B 19/14 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL; SUPPLEMENTARY PROCESSES IN THE MANUFACTURE OR SHAPING OF GLASS, OR OF MINERAL OR SLAG WOOL
19Other methods of shaping glass
14by gas-phase reaction processes
C03C 3/06 2006.01
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
3Glass compositions
04containing silica
06with more than 90% silica by weight, e.g. quartz
CPC
C03B 19/1415
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
19Other methods of shaping glass
14by gas- ; or vapour-; phase reaction processes
1415Reactant delivery systems
C03B 19/1453
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
19Other methods of shaping glass
14by gas- ; or vapour-; phase reaction processes
1453Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
C03B 2201/12
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
08doped with boron or fluorine or other refractive index decreasing dopant
12doped with fluorine
C03B 2201/42
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2201Type of glass produced
06Doped silica-based glasses
30doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
40doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
42doped with titanium
C03B 2207/30
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
2207Glass deposition burners
30For glass precursor of non-standard type, e.g. solid SiH3F
C03C 2201/12
CCHEMISTRY; METALLURGY
03GLASS; MINERAL OR SLAG WOOL
CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
2201Glass compositions
06Doped silica-based glasses
08containing boron or halide
12containing fluorine
Applicants
  • ASAHI GLASS COMPANY, LIMITED [JP]/[JP] (AllExceptUS)
  • IWAHASHI, Yasutomi [JP]/[JP] (UsOnly)
  • KOIKE, Akio [JP]/[JP] (UsOnly)
Inventors
  • IWAHASHI, Yasutomi
  • KOIKE, Akio
Agents
  • SENMYO, Kenji
Priority Data
2004-00038905.01.2004JP
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) SILICA GLASS
(FR) VERRE DE SILICE
Abstract
(EN)
A silica glass containing from 3 to 10 mass% of TiO2, which has a coefficient of thermal expansion from 0 to 100 °C, i.e. CTE0 to 100, of 0 ± 300 ppb/ °C and an internal transmittance per mm in thickness within a wavelength region of from 200 to 700 nm, i.e. T 200 to 700, of at most 80%.
(FR)
Selon invention, un verre de silice contient entre 3 et 10 % en masse de TiO2, il possède, d'une part, un coefficient de dilatation thermique compris entre 0 et 100 °C, par exemple, une dilatation thermique allant de 0 à 100, de 0 ± 300 ppb/ °C et, d'autre part, une transmittance interne par minute dans le sens de l'épaisseur, au sein d'une région de longueurs d'onde, comprise entre 200 et 700 nm, par exemple, une transmittance allant de 200 et 700, de 80 % tout au plus.
Also published as
Latest bibliographic data on file with the International Bureau