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1. (WO2005064405) LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2005/064405 International Application No.: PCT/EP2004/014282
Publication Date: 14.07.2005 International Filing Date: 15.12.2004
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven, NL (AllExceptUS)
VAN SANTEN, Helmar [NL/NL]; NL (UsOnly)
KOLESNYCHENKO, Aleksey, Yurievich [UA/NL]; NL (UsOnly)
Inventors:
VAN SANTEN, Helmar; NL
KOLESNYCHENKO, Aleksey, Yurievich; NL
Agent:
LEEMING, John, Gerard ; J.A. Kemp & Co. 14 South Square Gray's Inn London WC1R 5JJ, GB
Priority Data:
10/743,27123.12.2003US
Title (EN) LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL DE LITHOGRAPHIE, ET PROCEDE DE PRODUCTION DE DISPOSITIF
Abstract:
(EN) A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system (PL), a barrier member (10) and a substrate. The barrier member (10) is not sealed such that, during use, immersion liquid (5) is allowed to flow out the space and between the barrier member (10) and the substrate (W).
(FR) L'invention concerne un système d'alimentation en liquide pour un appareil de projection lithographique à immersion, dans lequel un espace est défini entre le système de projection, un élément barrière et un substrat. L'élément barrière n'est pas fermé hermétiquement de manière que, lors de l'utilisation, le liquide d'immersion puisse circuler hors de l'espace, et entre l'élément barrière et le substrat.
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)