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1. WO2005064404 - REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT

Publication Number WO/2005/064404
Publication Date 14.07.2005
International Application No. PCT/EP2004/013576
International Filing Date 30.11.2004
IPC
G02B 7/00 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
G02B 7/02 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
G02B 7/14 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
14adapted to interchange lenses
G02B 13/14 2006.01
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
14for use with infra-red or ultra-violet radiation
G03F 7/20 2006.01
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20Exposure; Apparatus therefor
CPC
G02B 13/14
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
13Optical objectives specially designed for the purposes specified below
14for use with infra-red or ultra-violet radiation
G02B 7/00
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
G02B 7/02
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
G02B 7/023
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
023permitting adjustment
G02B 7/14
GPHYSICS
02OPTICS
BOPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
7Mountings, adjusting means, or light-tight connections, for optical elements
02for lenses
14adapted to interchange lenses
G03F 7/7015
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70058Mask illumination systems
7015Details of optical elements
Applicants
  • CARL ZEISS SMT AG [DE]/[DE] (AllExceptUS)
  • KUGLER, Jens [DE]/[DE] (UsOnly)
  • SORG, Franz [DE]/[DE] (UsOnly)
  • WURMBRAND, Andreas [DE]/[DE] (UsOnly)
  • ITTNER, Thomas [DE]/[DE] (UsOnly)
  • SCHLETTERER, Thomas [DE]/[DE] (UsOnly)
Inventors
  • KUGLER, Jens
  • SORG, Franz
  • WURMBRAND, Andreas
  • ITTNER, Thomas
  • SCHLETTERER, Thomas
Agents
  • LORENZ, Werner
Priority Data
103 61 441.923.12.2003DE
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) REPLACEMENT APPARATUS FOR AN OPTICAL ELEMENT
(FR) APPAREIL DE REMPLACEMENT POUR ELEMENT OPTIQUE
Abstract
(EN)
A replacement apparatus for an optical element mounted be­tween two adjacent optical elements (2) in a lithography objec­tive (1) has a holder (5) for the optical element (2a) to be replaced, which holder (5) can be moved into the lithography objective (1) through a lateral opening (6) in a housing (1a) of the same.
(FR)
Un appareil de remplacement pour élément optique monté entre deux éléments optiques adjacents (2) dans un objectif de lithographie (1) comprend un support (5) pour l'élément optique à remplacer (2a), ledit support (5) pouvant être déplacé vers l'objectif de lithographie (1) via une ouverture latérale (6) dans un boîtier (1a) correspondant.
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