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1. (WO2005064399) LITHOGRAPHY SYSTEM USING A PROGRAMMABLE ELECTRO-WETTING MASK
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/064399    International Application No.:    PCT/IB2004/052620
Publication Date: 14.07.2005 International Filing Date: 01.12.2004
IPC:
G02B 26/02 (2006.01), G03F 1/00 (2012.01), G03F 7/20 (2006.01)
Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V. [NL/NL]; Groenewoudseweg 1, NL-5621 BA Eindhoven (NL) (For All Designated States Except US).
DIRKSEN, Peter [NL/NL]; (NL) (For US Only).
HAYES, Robert, A. [AU/NL]; (NL) (For US Only).
JUFFERMANS, Casparus, A., H. [NL/NL]; (NL) (For US Only).
STEFFEN, Thomas [DE/NL]; (NL) (For US Only)
Inventors: DIRKSEN, Peter; (NL).
HAYES, Robert, A.; (NL).
JUFFERMANS, Casparus, A., H.; (NL).
STEFFEN, Thomas; (NL)
Agent: ELEVELD, Koop, J.; Prof. Holstlaan 6, NL-5656 AA Eindhoven (NL)
Priority Data:
03104914.1 22.12.2003 EP
Title (EN) LITHOGRAPHY SYSTEM USING A PROGRAMMABLE ELECTRO-WETTING MASK
(FR) SYSTEME DE LITHOGRAPHIE UTILISANT UN MASQUE PROGRAMMABLE D'ELECTRO-MOUILLAGE
Abstract: front page image
(EN)A maskless lithography system is described having a programmable mask to allow performing several lithographic steps using the same mask. In every lithographic step, the corresponding pattern is obtained by providing a digital pattern to the programmable mask. The programmable mask includes an array of pixels which are based on the electro­-wetting principle. According to this principle, every pixel has a transparent reservoir containing a first, non-polar, non-transparent fluid and a second, polar, transparent fluid which are immiscible. Applying a field to the reservoir allows to displace the fluids with respect to each other. This allows to make the pixel either transparent or non-transparent. This lithographic programmable mask allows high resolution and fast setting and refreshing. A corresponding method for performing maskless optical lithography also is described.
(FR)Ce système de lithographie sans masque comprend un masque programmable qui permet d'exécuter plusieurs étapes lithographiques en utilisant le même masque. Pendant chaque étape lithographique, le motif correspondant est obtenu en fournissant un motif numérique au masque programmable. Le masque programmable comprend des rangées de pixels et se fonde sur le principe d'électro-mouillage. Selon ce principe, chaque pixel comprend un réservoir transparent qui contient un premier fluide non polaire et non transparent et un deuxième fluide polaire transparent, les deux fluides étant immiscibles. L'application d'un champ au réservoir permet de déplacer les fluides l'un par rapport à l'autre, ce qui permet de rendre le pixel transparent ou non transparent. Ce masque lithographique programmable permet d'obtenir une haute résolution, un séchage et une régénération rapides. L'invention concerne également une méthode correspondante de lithographie optique sans masque.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)