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1. (WO2005063968) BASAL MEDIUM FOR ES CELL CULTURING
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/063968    International Application No.:    PCT/JP2004/019818
Publication Date: 14.07.2005 International Filing Date: 27.12.2004
IPC:
C12N 5/00 (2006.01), C12N 5/0735 (2010.01)
Applicants: FURUE, Miho [JP/GB]; (GB).
OKAMOTO, Tetsuji [JP/JP]; (JP).
ASASHIMA, Makoto [JP/JP]; (JP)
Inventors: FURUE, Miho; (GB).
OKAMOTO, Tetsuji; (JP).
ASASHIMA, Makoto; (JP)
Agent: TANAKA, Reiko; Ohno & Partners, Kasumigaseki Building 36F, 2-5, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 100-6036 (JP)
Priority Data:
2003-434035 26.12.2003 JP
Title (EN) BASAL MEDIUM FOR ES CELL CULTURING
(FR) MILIEU DE BASE POUR LA CULTURE DE CELLULES ES
(JA) ES細胞培養用基礎培地
Abstract: front page image
(EN)A culture medium for serum-free medium that is capable of culturing ES cells for a prolonged period of time while retaining anaplasticity without the use of feeder cells; and a basal medium for production of such a culture medium. There is provided a basal medium characterized by having the composition of Table 1. There is further provided a culture medium for ES cells produced by this basal medium.
(FR)L'invention porte sur un milieu de culture destiné à un milieu sans sérum qui permet la culture de cellules ES sur une durée prolongée tout en conservant son caractère anaplasique sans utilisation de cellules nourricières, et sur un milieu de base destiné à production de ce milieu de culture. L'invention porte également sur un milieu de base caractérisé en ce qu'il présente la composition de la Table 1, ainsi que sur un milieu de culture de cellules ES produit par ce milieu de base.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)