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1. (WO2005061587) ADAMANTYL MONOMERS AND POLYMERS FOR LOW-K-DIELECTRIC APPLICATIONS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/061587    International Application No.:    PCT/FI2004/000799
Publication Date: 07.07.2005 International Filing Date: 23.12.2004
Chapter 2 Demand Filed:    24.10.2005    
IPC:
C07F 7/12 (2006.01), H01L 21/312 (2006.01)
Applicants: SILECS OY [FI/FI]; Tietotie 3, FI-02150 Espoo (FI) (For All Designated States Except US).
PAULASAARI, Jyri [FI/FI]; (FI) (For US Only).
RANTALA, Juha [FI/FI]; (FI) (For US Only)
Inventors: PAULASAARI, Jyri; (FI).
RANTALA, Juha; (FI)
Agent: SEPPO LAINE OY; Itämerenkatu 3 B, FIN-00180 Helsinki (FI)
Priority Data:
60/531,659 23.12.2003 US
Title (EN) ADAMANTYL MONOMERS AND POLYMERS FOR LOW-K-DIELECTRIC APPLICATIONS
(FR) MONOMÈRES ET POLYMÈRES D'ADAMANTYLE POUR APPLICATIONS DIÉLECTRIQUES À FAIBLE PERMITTIVITÉ
Abstract: front page image
(EN)The invention concerns novel silane compounds, which include an adamantyl residue linked to a silicon atom either directly by a carbon-to-silicon bond or, alternatively, via a bridging group, such as an alkylene group. The novel compounds contain at least one hydrolysable group linked to the silicon atom so as to provide for the polymerization of the compounds, e.g. for producing polymers useful as low-k materials.
(FR)Nouveaux composés silane qui contiennent un reste adamantyle lié à un atome de silicium soit directement par une liaison carbone-silicium, soit via un groupe de pontage, tel qu'un groupe alkylène. Ces nouveaux composés contiennent au moins un groupe hydrolysable lié à l'atome de silicium de manière à permettre la polymérisation des composés, par ex. pour produire des polymères utiles en tant que matières à faible permittivité.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SM, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)