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1. (WO2005059962) TEMPERATURE CONTROLLED HOT EDGE RING ASSEMBLY FOR REDUCING PLASMA REACTOR ETCH RATE DRIFT
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2005/059962 International Application No.: PCT/US2004/041768
Publication Date: 30.06.2005 International Filing Date: 10.12.2004
IPC:
H01J 37/32 (2006.01) ,H01L 21/00 (2006.01) ,H01L 21/687 (2006.01)
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
J
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32
Gas-filled discharge tubes
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
67
Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components
683
for supporting or gripping
687
using mechanical means, e.g. chucks, clamps or pinches
Applicants:
LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway Fremont, CA 94538, US (AllExceptUS)
FISCHER, Andreas [DE/US]; US (UsOnly)
LOEWENHARDT, Peter [CA/US]; US (UsOnly)
Inventors:
FISCHER, Andreas; US
LOEWENHARDT, Peter; US
Agent:
PETERSON, James, W.; Burns, Doane, Swecker & Mathis, LLP P.O. Box 1404 Alexandria, VA 22313-1404, US
Priority Data:
10/736,66617.12.2003US
Title (EN) TEMPERATURE CONTROLLED HOT EDGE RING ASSEMBLY FOR REDUCING PLASMA REACTOR ETCH RATE DRIFT
(FR) ENSEMBLE D'ANNEAUX DE BORDURE A CHAUD A TEMPERATURE REGULEE PERMETTANT DE REDUIRE LA DERIVE DE LA VITESSE DE GRAVURE D'UN REACTEUR A PLASMA
Abstract:
(EN) A temperature-controlled hot edge ring assembly adapted to surround a substrate support in a plasma reaction chamber. The assembly includes a conductive lower ring, a ceramic intermediate ring, and an upper ring. The intermediate ring overlies the lower ring and is adapted to be attached via the lower ring to an RF electrode. The upper ring overlies the intermediate ring, and has an upper surface exposed to an interior of a plasma reaction chamber.
(FR) L'invention concerne un ensemble d'anneaux de bordure à chaud à température régulée conçu pour entourer un support de substrat dans une chambre de réaction à plasma. L'ensemble comprend un anneau inférieur conducteur, un anneau intermédiaire céramique et un anneau supérieur. L'anneau intermédiaire recouvre l'anneau inférieur et est conçu pour être fixé par le biais de l'anneau inférieur à une électrode RF. L'anneau supérieur recouvre l'anneau intermédiaire et comprend une surface supérieure exposée à l'intérieur d'une chambre de réaction à plasma.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IS, IT, LT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020060127041EP1706898JP2007515081CN1914712