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1. (WO2005038523) IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/038523 International Application No.: PCT/US2004/030269
Publication Date: 28.04.2005 International Filing Date: 16.09.2004
IPC:
G03F 9/00 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
9
Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applicants:
BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM [US/US]; Ashbel Smith Hall, 7th Floor The University of Texas System Austin, Texas 78701, US (AllExceptUS)
Inventors:
BAILEY, Todd C.; US
JOHNSON, Stephen C.; US
COLBURN, Matthew E.; US
CHOI, Byung J.; US
SMITH, Britain J.; US
EKERDT, John G.; US
WILLSON, Carlton G.; US
SREENIVASAN, Sidlgata V.; US
Agent:
BROOKS, Kenneth C.; P.O. Box 81536 Austin, TX 78708-1536, US
Priority Data:
10/666,52718.09.2003US
Title (EN) IMPRINT LITHOGRAPHY TEMPLATES HAVING ALIGNMENT MARKS
(FR) MODELES DE LITHOGRAPHIE D'IMPRESSION COMPORTANT DES REPERES D'ALIGNEMENT
Abstract:
(EN) One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
(FR) Dans un mode de réalisation, l'invention concerne un modèle d'impression pour la lithographie d'impression, qui comprend des repères d'alignement enrobés dans le matériau en vrac du modèle d'impression.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)