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1. (WO2005036666) METHOD OF PREPARING AN INSOLUBLE POLYMER FILM ON A SUBSTRATE FROM A SOLUBLE POLYMER CONTAINING LABILE SOLUBILIZING GROUPS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/036666    International Application No.:    PCT/US2004/029154
Publication Date: 21.04.2005 International Filing Date: 08.09.2004
IPC:
H01L 51/30 (2006.01), H01L 51/40 (2006.01)
Applicants: DOW GLOBAL TECHNOLOGIES INC. [US/US]; Washington Street, 1790 Building, Midland, MI 48674 (US) (For All Designated States Except US).
DIBBS, Mitchell, G. [US/US]; (US) (For US Only).
INBASEKARAN, Michael [US/US]; (US) (For US Only).
TOWNSEND, Paul, H., III [US/US]; (US) (For US Only).
FOSTER, Kenneth, L. [US/US]; (US) (For US Only).
FENG, Shaoguang [US/US]; (US) (For US Only).
BRENNAN, David, J. [US/US]; (US) (For US Only).
NIU, Q., Jason [US/US]; (US) (For US Only).
GODSCHALX, James, P. [US/US]; (US) (For US Only).
WELSH, Dean, M. [US/US]; (US) (For US Only).
DRUMRIGHT, Ray, E. [US/US]; (US) (For US Only)
Inventors: DIBBS, Mitchell, G.; (US).
INBASEKARAN, Michael; (US).
TOWNSEND, Paul, H., III; (US).
FOSTER, Kenneth, L.; (US).
FENG, Shaoguang; (US).
BRENNAN, David, J.; (US).
NIU, Q., Jason; (US).
GODSCHALX, James, P.; (US).
WELSH, Dean, M.; (US).
DRUMRIGHT, Ray, E.; (US)
Agent: ZERULL, Susan, Moeller; The Dow Chemical Company, Intellectual Property, P.O. Box 1967, Midland, MI 48641-1967 (US)
Priority Data:
60/503,229 16.09.2003 US
Title (EN) METHOD OF PREPARING AN INSOLUBLE POLYMER FILM ON A SUBSTRATE FROM A SOLUBLE POLYMER CONTAINING LABILE SOLUBILIZING GROUPS
(FR) PROCEDE DE PREPARATION D'UN FILM POLYMERE INSOLUBLE SUR UN SUBSTRAT A PARTIR D'UN POLYMERE SOLUBLE CONTENANT DES GROUPES DE SOLUBILISATION LABILES
Abstract: front page image
(EN)The present invention relates to a method for preparing polymeric films, preferably electroactive films, with enhanced physical properties by the steps of applying to a substrate a solution of a polymer containing pendant labile solubilizing groups, then removing the solvent and a sufficient concentration of the labile solubilizing groups render the polymer less soluble in the solvent than before the labile groups were removed. It is believed that the removal of pendant soluble groups a) permits optimization of the semiconducting backbone for charge transport performance, b) allows direct control of microstructure in the final film, and c) renders the final film more robust during subsequent process steps needed to construct multilayer devices.
(FR)L'invention concerne un procédé de préparation de films polymères, de préférence des films électroactifs, avec des propriétés physiques améliorées par les étapes consistant à appliquer à un substrat une solution d'un polymère contenant des groupes de solubilisation labiles latéraux, puis à éliminer le solvant, et une concentration suffisante des groupes de solubilisation labiles rend ce polymère moins soluble dans le solvant qu'avant le retrait des groupes labiles. Le retrait de groupes solubles latéraux a) permet l'optimisation du squelette semi-conducteur pour la performance de transport de charge, b) permet la commande directe de la microstructure dans le film final et c) rend le film final plus robuste durant les étapes de traitement subséquentes, nécessaires à la construction de dispositifs à couches multiples.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)