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1. (WO2005036271) SYSTEMS AND METHODS FOR FABRICATING MICROSTRUCTURES BY IMAGING A RADIATION SENSITIVE LAYER SANDWICHED BETWEEN OUTER LAYERS, AND MICROSTRUCTURES FABRICATED THEREBY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/036271    International Application No.:    PCT/US2004/027071
Publication Date: 21.04.2005 International Filing Date: 20.08.2004
Chapter 2 Demand Filed:    21.07.2005    
IPC:
G03F 7/09 (2006.01), G03F 7/16 (2006.01)
Applicants: BRIGHT VIEW TECHNOLOGIES, INC. [US/US]; 2300 Englert Drive, Suite B, Durham, NC 27713 (US) (For All Designated States Except US).
FREESE, Robert, P. [US/US]; (US) (For US Only).
RINEHART, Thomas, A. [US/US]; (US) (For US Only).
WOOD, Robert, L. [US/US]; (US) (For US Only)
Inventors: FREESE, Robert, P.; (US).
RINEHART, Thomas, A.; (US).
WOOD, Robert, L.; (US)
Agent: MYERS BIGEL SIBLEY & SAJOVEC, PA; P.O. Box 37428, Raleigh, NC 27627 (US)
Priority Data:
10/661,974 11.09.2003 US
Title (EN) SYSTEMS AND METHODS FOR FABRICATING MICROSTRUCTURES BY IMAGING A RADIATION SENSITIVE LAYER SANDWICHED BETWEEN OUTER LAYERS, AND MICROSTRUCTURES FABRICATED THEREBY
(FR) SYSTEMES ET PROCEDES DE FABRICATION DE MICROSTRUCTURES PAR FORMATION D'IMAGE SUR UNE COUCHE SENSIBLE AU RAYONNEMENT PRISE EN SANDWICH ENTRE DES COUCHES EXTERIEURES, ET MICROSTRUCTURES AINSI FABRIQUEES
Abstract: front page image
(EN)Microstructures are fabricated by imaging a microstructure master blank that includes a radiation sensitive layer (2320) sandwiched between a pair of outer layers (2310, 2330), on an imaging platform (2500), to define the microstructures in the radiation sensitive layer. At least one of the outer layers is then removed. The microstructures that were defined in the radiation sensitive layer are developed. The radiation sensitive layer sandwiched between the pair of outer layers may be fabricated as webs, to provide microstructure master blanks.
(FR)On fabrique des microstructures en formant une image sur une ébauche maîtresse comportant une couche sensible au rayonnement prise en sandwich entre une paire de couches extérieures, sur une plate-forme de formation d'image, pour définir les microstructures dans la couche sensible au rayonnement. On enlève ensuite au moins une des couches extérieures. On développe les microstructures définies dans la couche sensible au rayonnement. On peut fabriquer la couche sensible au rayonnement prise en sandwich entre la paire de couches extérieure, sous forme de bandes, pour produire des ébauches maîtresses de microstructure.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)