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1. (WO2005034226) METAL POLISHING COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/034226    International Application No.:    PCT/JP2004/014235
Publication Date: 14.04.2005 International Filing Date: 29.09.2004
IPC:
B24B 37/00 (2012.01), C09G 1/02 (2006.01), C09K 3/14 (2006.01), C23F 1/18 (2006.01), C23F 1/20 (2006.01), C23F 1/26 (2006.01), H01L 21/304 (2006.01), H01L 21/321 (2006.01), H01L 21/768 (2006.01)
Applicants: Asahi Kasei Chemicals Corporation [JP/JP]; 1-2, Yurakucho 1-chome, Chiyoda-ku, Tokyo 1008440 (JP) (For All Designated States Except US).
FUNAKOSHI, Shinji [JP/JP]; (JP) (For US Only).
OKITA, Koshi [JP/JP]; (JP) (For US Only)
Inventors: FUNAKOSHI, Shinji; (JP).
OKITA, Koshi; (JP)
Agent: ASAMURA, Kiyoshi; Room 331, New Ohtemachi Bldg., 2-1, Ohtemachi 2-chome, Chiyoda-ku, Tokyo 1000004 (JP)
Priority Data:
2003-343066 01.10.2003 JP
Title (EN) METAL POLISHING COMPOSITION
(FR) COMPOSITION DE POLISSAGE DES METAUX
(JA) 金属研磨組成物
Abstract: front page image
(EN)A metal polishing composition is disclosed which contains a polyoxo acid, an anionic surfactant and water.
(FR)Cette invention concerne une composition de polissage des métaux qui renferme un acide polyoxo, un surfactif anionique et de l'eau.
(JA) ポリオキソ酸、アニオン性界面活性剤及び水を含んでなる金属研磨組成物。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)