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Pub. No.:    WO/2005/033090    International Application No.:    PCT/JP2004/015001
Publication Date: 14.04.2005 International Filing Date: 05.10.2004
C07D 307/91 (2006.01)
Applicants: SUMITOMO CHEMICAL COMPANY, LIMITED [JP/JP]; 27-1, Shinkawa 2-chome Chuo-ku Tokyo 1048260 (JP) (For All Designated States Except US).
KOBAYASHI, Satoshi [JP/JP]; (JP) (For US Only).
MIKAMI, Satoshi [JP/JP]; (JP) (For US Only)
Inventors: KOBAYASHI, Satoshi; (JP).
MIKAMI, Satoshi; (JP)
Agent: ENOMOTO, Masayuki; c/o Sumitomo Chemical Intellectual Property Service, Limited 5-33, Kitahama 4-chome Chuo-ku, Osaka-shi Tokyo 5418550 (JP)
Priority Data:
2003-346688 06.10.2003 JP
(JA) 芳香族化合物
Abstract: front page image
(EN)Disclosed is an aromatic compound represented by the following formula (1), (2), (5) or (6). In the above formulae, Ar1 and Ar3 represent a tetravalent aromatic hydrocarbon group or a tetravalent heterocyclic group; Ar2, Ar4, Ar5, Ar6 and Ar7 represent a trivalent aromatic hydrocarbon group or a trivalent heterocyclic group; A1 represent -Z1-, -Z2-Z3- or -Z4=Z5- wherein Z1, Z2 and Z3 represent O, S or the like and Z4 and Z5 represent N, B, P or the like; and X1, X2, X3, X4, X9, X10, X11 and X12 represent a halogen atom or the like.
(FR)L'invention concerne un composé aromatique représenté par les formules suivantes (1), (2), (5) ou (6). Dans les formules susmentionnées, Ar1 et Ar3 représentent un groupe hydrocarboné aromatique tétravalent ou un groupe hétérocyclique tétravelent, Ar2, Ar4, Ar5, Ar6 et Ar7 représentent un groupe hydrocarboné aromatique trivalent ou un groupe hétérocyclique trivalent, A1 représente -Z1-, -Z2-Z3- ou -Z4=Z5-, Z1, Z2 et Z3 représentent O, S ou similaire et Z4 et Z5 représentent N, B, P ou similaire, et X1, X2, X3, X4, X9, X10, X11et X12 représentent un halogène ou similaire.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)