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Pub. No.:    WO/2005/031839    International Application No.:    PCT/JP2004/014407
Publication Date: 07.04.2005 International Filing Date: 30.09.2004
H01L 21/205 (2006.01), H01L 21/3065 (2006.01), H01L 21/324 (2006.01), H01L 21/42 (2006.01)
Applicants: TOKYO ELECTRON LIMITED [JP/JP]; 3-6, Akasaka 5-chome, Minato-ku, Tokyo 1078481 (JP) (For All Designated States Except US).
Advanced Energy Industries, Inc. [US/US]; 1625, Sharp Point Drive, Fort Collins, Colorado 80525 (US) (For All Designated States Except US).
MIYOSHI, Hideaki [JP/JP]; (For US Only).
DHARMASENA, Gemunu, Ranjith [LK/JP]; (For US Only).
HIGASHIURA, Tsutomu [JP/JP]; (For US Only).
GILMORE, Jack, A. [US/US]; (For US Only).
OSSELBURN, Joseph, J. [US/US]; (For US Only).
BEIZER, Theresa [US/US]; (For US Only)
Inventors: MIYOSHI, Hideaki; .
DHARMASENA, Gemunu, Ranjith; .
HIGASHIURA, Tsutomu; .
GILMORE, Jack, A.; .
OSSELBURN, Joseph, J.; .
BEIZER, Theresa;
Agent: SUZUYE, Takehiko; c/o SUZUYE & SUZUYE, 7-2, Kasumigaseki 3-chome, Chiyoda-ku, Tokyo 1000013 (JP)
Priority Data:
10/673,514 30.09.2003 US
(JA) プラズマ処理システム
Abstract: front page image
(EN)A processing system (100) includes a processing chamber (120) having a substrate holder (130) and an electrode (125). The processing system includes a compression control system, a gas supplying system, and a monitor device (160). The electrode (125) is connected to a multi-frequency RF power supply (110) via a matching circuit (115) having a single variable element. The multi-frequency RF power supply is set to a first frequency so as to ignite plasma or set to a second frequency so as to sustain the plasma.
(FR)L'invention concerne un système de traitement (100) qui comprend une chambre de traitement (120) comportant un porte-substrat (130) et une électrode (125). Ce système de traitement comprend un système de régulation de compression, un système d'alimentation en gaz et un dispositif de type moniteur (160). L'électrode est reliée à une alimentation RF multi-fréquence (110) par l'intermédiaire d'un circuit de correspondance (115) possédant un élément variable unique. L'alimentation RF multi-fréquence est réglée à une première fréquence afin de procéder à l'allumage du plasma ou à une deuxième fréquence afin de maintenir la production de plasma.
(JA) 処理システム(100)は、基板ホルダ(130)と電極(125)とを有する処理チャンバ(120)を含む。処理システムは、圧力制御システムとガス供給系とモニタ装置(160)とを含む。電極(125)には、単一可変素子を有する整合回路(115)を介して、マルチ周波数RF電源(110)が接続される。マルチ周波数RF電源は、プラズマを点火するように第1の周波数に設定され、プラズマを維持するように第2の周波数に設定される。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)