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1. (WO2005031820) PROJECTION EXPOSURE APPARATUS, CLEANING AND MAINTENANCE METHODS OF PROJECTION EXPOSURE APPARATUS, AND METHOD OF PRODUCING DEVICE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/031820 International Application No.: PCT/JP2004/013906
Publication Date: 07.04.2005 International Filing Date: 24.09.2004
IPC:
G03F 7/20 (2006.01) ,H01L 21/027 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
H ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
027
Making masks on semiconductor bodies for further photolithographic processing, not provided for in group H01L21/18 or H01L21/34165
Applicants: TANI, Yasuhisa[JP/JP]; JP (UsOnly)
SHIOZAWA, Masaki[JP/JP]; JP (UsOnly)
NIKON CORPORATION[JP/JP]; 2-3, Marunouchi 3-chome, Chiyoda-ku Tokyo 1008331, JP (AllExceptUS)
Inventors: TANI, Yasuhisa; JP
SHIOZAWA, Masaki; JP
Agent: FUJIMOTO, Yoshihiro; Sanshin-Hirose Bldg. 5F, 6-1, Uchikanda 3-chome, Chiyoda-ku Tokyo 1010047, JP
Priority Data:
2003-33569126.09.2003JP
2003-33962530.09.2003JP
Title (EN) PROJECTION EXPOSURE APPARATUS, CLEANING AND MAINTENANCE METHODS OF PROJECTION EXPOSURE APPARATUS, AND METHOD OF PRODUCING DEVICE
(FR) DISPOSITIF D'ECLAIRAGE DE PROJECTION, PROCEDE DE NETTOYAGE ET D'ENTRETIEN DU DISPOSITIF D'ECLAIRAGE DE PROJECTION, ET PROCEDE DE FABRICATION D'UN TEL DISPOSITIF
(JA) 投影露光装置及び投影露光装置の洗浄方法、メンテナンス方法並びにデバイスの製造方法
Abstract:
(EN) A projection exposure apparatus exposes a substrate (W) with a liquid (7) placed between the surface of the substrate (W) and an optical element on the substrate (W) side of a projection optical system (PL). The apparatus has liquid supply/discharge mechanisms (5, 6) and an adhesion preventing mechanism (210). The liquid supply/discharge mechanisms (5, 6) supply the liquid (7) through a liquid supply tube (21) and recover the liquid (7) through a liquid recovery tube (23). The adhesion preventing mechanism (210) prevents adhesion of impurities on a member forming a flow path for the liquid.
(FR) La présente invention concerne un dispositif d'éclairage de projection conçu pour exposer un substrat (W) avec un liquide (7) placé entre la surface du substrat (W) et un élément optique sur le côté substrat (W) d'un système optique de projection (PL). Le dispositif présente des mécanismes d'alimentation/évacuation de liquide (5, 6) et un mécanisme empêchant l'adhérence (210). Lesdits mécanismes (5, 6) fournissent le liquide (7) à travers un tube d'alimentation de liquide (21) et récupèrent le liquide (7) par l'intermédiaire d'un tube de récupération de liquide (23). Le mécanisme empêchant l'adhérence (210) empêche l'adhérence d'impuretés sur un élément formant un circuit d'écoulement pour le liquide.
(JA)  基板Wの表面と投影光学系PLの基板W側の光学素子との間に所定の液体7を介在させて基板Wを露光する投影露光装置において、液体7を液体供給管21を介して供給すると共に液体7を液体回収管23を介して回収する液体供給排出機構5,6と、液体の流路を形成する部材への不純物の付着を防止する付着防止機構210とを備える。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)