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1. WO2005024881 - PARTICLE-OPTICAL SYSTEMS, COMPONENTS AND ARRANGEMENTS

Publication Number WO/2005/024881
Publication Date 17.03.2005
International Application No. PCT/US2004/029079
International Filing Date 07.09.2004
IPC
G21K 5/10 2006.1
GPHYSICS
21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
5Irradiation devices
10with provision for relative movement of beam source and object to be irradiated
G01N 23/00 2006.1
GPHYSICS
01MEASURING; TESTING
NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
23Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/-G01N17/178
H01J 37/28 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
26Electron or ion microscopes; Electron- or ion-diffraction tubes
28with scanning beams
CPC
B82Y 10/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
10Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
B82Y 40/00
BPERFORMING OPERATIONS; TRANSPORTING
82NANOTECHNOLOGY
YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
40Manufacture or treatment of nanostructures
H01J 1/00
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
1Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
H01J 2237/0435
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
043Beam blanking
0435Multi-aperture
H01J 2237/0453
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
045Diaphragms
0451with fixed aperture
0453multiple apertures
H01J 2237/047
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
04Means for controlling the discharge
047Changing particle velocity
Applicants
  • CARL ZEISS SMT AG [DE]/[DE] (AllExceptUS)
  • APPLIED MATERIALS ISRAEL [IL]/[IL] (AllExceptUS)
  • KNIPPELMEYER, Rainer [DE]/[DE] (UsOnly)
  • KIENZLE, Oliver [DE]/[DE] (UsOnly)
  • KEMEN, Thomas [DE]/[DE] (UsOnly)
  • MUELLER, Heiko [DE]/[DE] (UsOnly)
  • UHLEMANN, Stephan [DE]/[DE] (UsOnly)
  • HAIDER, Maximilian [DE]/[DE] (UsOnly)
  • CASARES, Antonio [DE]/[DE] (UsOnly)
  • ROGERS, Steven [US]/[IL] (UsOnly)
Inventors
  • KNIPPELMEYER, Rainer
  • KIENZLE, Oliver
  • KEMEN, Thomas
  • MUELLER, Heiko
  • UHLEMANN, Stephan
  • HAIDER, Maximilian
  • CASARES, Antonio
  • ROGERS, Steven
Agents
  • PETERSON, James, W.
Priority Data
60/500,25605.09.2003US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) PARTICLE-OPTICAL SYSTEMS, COMPONENTS AND ARRANGEMENTS
(FR) SYSTEMES ET DISPOSITIFS D'OPTIQUE PARTICULAIRE ET COMPOSANTS D'OPTIQUE PARTICULAIRE POUR DE TELS SYSTEMES ET DISPOSITIFS
Abstract
(EN) A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
(FR) La présente invention concerne un dispositif d'optique particulaire comprenant une source de particules chargées permettant de produire un faisceau de particules chargées. Une grille à ouvertures multiples est agencée sur le trajet du faisceau des particules chargées. Les ouvertures de la grille respectent un dessin particulier. Une pluralité de petits faisceaux de particules chargées se forme à partir du faisceau, en aval de la grille. La pluralité de petits faisceaux vient former une pluralité de points de faisceau dans un plan image de l'appareil, la pluralité de points de faisceau étant agencée selon un second dessin. L'invention concerne également un élément d'optique particulaire permettant de manipuler le faisceau de particules chargées et/ou la pluralité de petits faisceaux. En l'occurrence, le premier dessin présente une première régularité selon un premier axe, le deuxième dessin présentant une deuxième régularité selon un deuxième axe correspondant électroniquement et optiquement au premier axe. Enfin, la deuxième régularité est supérieure à la première régularité.
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US11366533This application is not viewable in PATENTSCOPE because the national phase entry has not been published yet or the national entry is issued from a country that does not share data with WIPO or there is a formatting issue or an unavailability of the application.
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