Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2005023923) METHODS OF PROCESSING NANOCRYSTALS, AND COMPOSITIONS, DEVICES AND SYSTEMS INCLUDING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/023923 International Application No.: PCT/US2004/028966
Publication Date: 17.03.2005 International Filing Date: 02.09.2004
IPC:
B01D 9/00 (2006.01)
B PERFORMING OPERATIONS; TRANSPORTING
01
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
D
SEPARATION
9
Crystallisation
Applicants:
SCHER, Erik [US/US]; US (UsOnly)
BURETEA, Mihai [US/US]; US (UsOnly)
WHITEFORD, Jeffery, A. [US/US]; US (UsOnly)
MEISEL, Andreas [DE/US]; US (UsOnly)
NANOSYS, INC. [US/US]; 2625 Hanover Street Palo Alto, CA 94304, US (AllExceptUS)
Inventors:
SCHER, Erik; US
BURETEA, Mihai; US
WHITEFORD, Jeffery, A.; US
MEISEL, Andreas; US
Agent:
QUINE, Jonathan, Alan ; Quine Intellectual Property Law Group, P.C. P.O. Box 458 Alameda, CA 94501, US
Priority Data:
10/656,80204.09.2003US
10/656,91004.09.2003US
60/544,28511.02.2004US
Title (EN) METHODS OF PROCESSING NANOCRYSTALS, AND COMPOSITIONS, DEVICES AND SYSTEMS INCLUDING SAME
(FR) PROCEDES DE TRAITEMENT DE NANOCRISTAUX ET COMPOSITIONS, DISPOSITIFS ET SYSTEMES COMPRENANT CES NANOCRISTAUX
Abstract:
(EN) Methods of processing nanocrystals to remove excess free and bound organic material and particularly surfactants used during the synthesis process, and resulting nanocrystal compositions, devices and systems that are physically, electrically and chemically integratable into an end application.
(FR) L'invention concerne des procédés de traitement de nanocristaux destinés à éliminer l'excédent de matière organique libre et liée et en particulier des tensioactifs utilisés au cours du processus de synthèse. L'invention concerne également des compositions, des dispositifs et des systèmes comprenant des nanocristaux traités par ce procédé, ces compositions, dispositifs et systèmes pouvant être intégrés physiquement, électriquement et chimiquement dans une application finale.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)