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1. WO2005020644 - EUV LIGHT SOURCE

Publication Number WO/2005/020644
Publication Date 03.03.2005
International Application No. PCT/JP2004/011905
International Filing Date 19.08.2004
IPC
H05G 1/00 2006.1
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
1X-ray apparatus involving X-ray tubes; Circuits therefor
CPC
G03F 7/70008
GPHYSICS
03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR;
7Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
70Exposure apparatus for microlithography
70008Production of exposure light, i.e. light sources
H01L 2924/01013
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
2924Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
01Chemical elements
01013Aluminum [Al]
H01L 2924/01019
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
2924Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
01Chemical elements
01019Potassium [K]
H05G 2/00
HELECTRICITY
05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
GX-RAY TECHNIQUE
2Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
Applicants
  • 理学電機工業株式会社 RIGAKU INDUSTRIAL CORPORATION [JP]/[JP] (AllExceptUS)
  • 山田 隆 YAMADA, Takashi [JP]/[JP] (UsOnly)
  • 西村 博明 NISHIMURA, Hiroaki [JP]/[JP] (UsOnly)
Inventors
  • 山田 隆 YAMADA, Takashi
  • 西村 博明 NISHIMURA, Hiroaki
Agents
  • 杉本 修司 SUGIMOTO, Shuji
Priority Data
2003-29992725.08.2003JP
Publication Language Japanese (ja)
Filing Language Japanese (JA)
Designated States
Title
(EN) EUV LIGHT SOURCE
(FR) SOURCE DE LUMIERE UV EXTREMES
(JA) EUV光源
Abstract
(EN) An EUV light source having a simple structure which is capable of generating EUV stably with a sufficient intensity and serves as an alternative to a laser plasma light source. The EUV light source comprises an X-ray tube (1) having a primary target, and a secondary target (4) being irradiated with X-rays (2) emitted from the X-ray tube (1). The secondary target (4) generates one fluorescence X-ray (5) selected from a group of Be-K&agr; ray, Si-L ray and Al-L ray.
(FR) L'invention concerne une source de lumière UV extrêmes de structure simple qui peut générer des UV extrêmes de manière stable avec une intensité suffisante et sert d'alternative à une source de lumière plasma laser. La source de lumière UV extrêmes comprend un tube à rayons X (1) présentant une cible primaire, une cible secondaire (4) étant irradiée à l'aide de rayons X (2) émis à partir du tube à rayons X (1). La cible secondaire (4) génère un rayon X fluorescent (5) sélectionné dans un groupe constitué par un rayon Be-K$g(a), un rayon Si-L et un rayon Al-L.
(JA)  簡単な構造で、十分な強度のEUVを安定して発生させることができ、レーザプラズマ光源の代替となるEUV光源を提供する。1次ターゲットを有するX線管1と、そのX線管1から発生したX線2が照射される2次ターゲット4とを備え、その2次ターゲット4から、Be−Kα線、Si−L線およびAl−L線の一群から選ばれた1つの蛍光X線5を発生させる。
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