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1. (WO2005016656) IMAGING MATERIAL WITH IMPROVED SCRATCH RESISTANCE
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/016656 International Application No.: PCT/US2004/023538
Publication Date: 24.02.2005 International Filing Date: 21.07.2004
IPC:
G03C 1/76 (2006.01) ,G03C 1/775 (2006.01) ,G03C 1/79 (2006.01) ,G03C 1/795 (2006.01)
Applicants: RAO, Yuanqiao[CN/US]; US (UsOnly)
SEDITA, Joseph, Salvatore[US/US]; US (UsOnly)
EASTMAN KODAK COMPANY[US/US]; 343 State Street Rochester, NY 14650-2201, US (AllExceptUS)
Inventors: RAO, Yuanqiao; US
SEDITA, Joseph, Salvatore; US
Common
Representative:
EASTMAN KODAK COMPANY; 343 State Street Rochester, NY 14650-2201, US
Priority Data:
10/633,80604.08.2003US
Title (EN) IMAGING MATERIAL WITH IMPROVED SCRATCH RESISTANCE
(FR) MATERIAU D'IMAGERIE AYANT UNE MEILLEURE RESISTANCE AUX RAYURES
Abstract: front page image
(EN) The present invention relates to an imaging element comprising a support, an imaging layer, and at least one layer comprising a clay nanocomposite wherein said nanocomposite comprises a splayant and at least one natural clay particle having an aspect ratio of from 20:1 to 500:1.
(FR) La présente invention porte sur un élément d'imagerie comprenant un support, une couche d'imagerie et au moins une couche comprenant un nanocomposite d'argile. Ce nanocomposite comprend un élément d'exfoliation et au moins une particule d'argile naturelle dont le rapport d'aspect est compris entre 20:1 et 500:1.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)