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1. (WO2005015309) ALKALI-DEVELOPABLE RADIATION CURABLE COMPOSITION
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/015309    International Application No.:    PCT/EP2004/007731
Publication Date: 17.02.2005 International Filing Date: 13.07.2004
IPC:
C08F 290/00 (2006.01), C08F 290/06 (2006.01), C08F 290/14 (2006.01), C08G 59/06 (2006.01), C08G 59/14 (2006.01), C08G 59/17 (2006.01), C08L 53/00 (2006.01), G03F 7/038 (2006.01)
Applicants: CYTEC SURFACE SPECIALTIES, S.A. [BE/BE]; Square Marie Curie 11, B-1070 Brussels (BE) (For All Designated States Except US).
CHEW, Kong, Chin [MY/MY]; (MY) (For US Only)
Inventors: CHEW, Kong, Chin; (MY)
Agent: DESTRYKER, Elise; CYTEC SURFACE SPECIALTIES S.A., Patent Department, Anderlechtstraat 33, B-1620 Drogenbos (BE)
Priority Data:
PI 2003 2693 17.07.2003 MY
Title (EN) ALKALI-DEVELOPABLE RADIATION CURABLE COMPOSITION
(FR) COMPOSITION DURCISSABLE AU RAYONNEMENT, A DEVELOPPEMENT ALCALIN
Abstract: front page image
(EN)The invention provides a radiation curable polymer described as dianhydride- polyol extended epoxy acrylate bearing carboxylic groups, as represented by Formula (&thetas;) below; which is useful in alkali-developable photosensitive formulations for the fabrication of printed circuit boards or flat panel displays.
(FR)L'invention concerne un polymère durcissable au rayonnement, sous la forme d'acrylate d'époxy à extension dianhydride-polyol porteur de groupes carboxyliques, de formule (?) ci-après, utile dans les formulations photosensibles à développement alcalin, pour la fabrication de cartes imprimées ou d'afficheurs à écran plat.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)