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1. (WO2005013003) MULTILAYER REFLECTIVE EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/013003 International Application No.: PCT/US2004/023237
Publication Date: 10.02.2005 International Filing Date: 16.07.2004
IPC:
G03F 1/14 (2006.01)
Applicants: INTEL CORPORATION[US/US]; 2200 Mission College Boulevard Santa Clara, CA 95052, US (AllExceptUS)
Inventors: YAN, Pei-Yang; US
Agent: TROP, Timothy, N. ; Trop, Pruner & Hu, P.C. 8554 Katy Freeway Suite 100 Houston, TX 77024, US
Priority Data:
10/631,17131.07.2003US
Title (EN) MULTILAYER REFLECTIVE EXTREME ULTRAVIOLET LITHOGRAPHY MASK BLANKS
(FR) DECOUPES DE MASQUE REFLECHISSANT ET MULTICOUCHE DE LITHOGRAPHIE DANS L'ULTRAVIOLET EXTREME
Abstract:
(EN) An extreme ultraviolet lithography mask may be formed of a multilayered stack covered by a spacer layer, such as silicon or boron carbide, in turn covered by a thin layer to prevent inter-diffusion, and finally covered by a capping layer of ruthenium. By optimizing the spacer layer thickness based on the capping layer, the optical properties may be improved.
(FR) L'invention concerne un masque de lithographie dans l'ultraviolet extrême qui peut être constitué d'une pile multicouche recouverte d'une couche de séparation, telle que du carbure de silicium ou de bore, recouverte à son tour par une fine couche servant à prévenir l'interdiffusion et recouverte enfin d'une couche de revêtement de ruthénium. L'optimisation de l'épaisseur de la couche de séparation en se basant sur la couche de revêtement permet d'améliorer les propriétés optiques.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)