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1. (WO2005012372) FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, METHOD FOR PRODUCING SAME AND RESIST COMPOSITION CONTAINING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2005/012372 International Application No.: PCT/JP2004/010856
Publication Date: 10.02.2005 International Filing Date: 29.07.2004
IPC:
C07C 69/65 (2006.01) ,C08F 36/20 (2006.01)
Applicants: TAKEBE, Yoko[JP/JP]; JP (UsOnly)
KANEKO, Isamu[JP/JP]; JP (UsOnly)
ASAHI GLASS COMPANY, LIMITED[JP/JP]; 12-1, Yurakucho 1-chome Chiyoda-ku, Tokyo 1008405, JP (AllExceptUS)
Inventors: TAKEBE, Yoko; JP
KANEKO, Isamu; JP
Agent: SENMYO, Kenji; Torimoto Kogyo Bldg. 38, Kanda-Higashimatsushitacho Chiyoda-ku, Tokyo 1010042, JP
Priority Data:
2003-28415631.07.2003JP
2004-08833725.03.2004JP
Title (EN) FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER, METHOD FOR PRODUCING SAME AND RESIST COMPOSITION CONTAINING SAME
(FR) COMPOSE FLUORE, POLYMERE FLUORE, METHODE DE PRODUCTION ET COMPOSITION DE RESINE CONTENANT CES COMPOSES
(JA) 含フッ素化合物、含フッ素ポリマーとその製造方法およびそれを含むレジスト組成物
Abstract:
(EN) A fluorine-containing polymer is disclosed which has a functional group and exhibits high transparency over a wide wavelength range. Also disclosed is a resist composition composed of such a fluorine-containing polymer. A fluorine-containing polymer (A) has a monomer unit wherein a fluorine-containing diene represented by the formula (1) below is polymerized. A method for producing the fluorine-containing polymer (A) and a resist composition using the fluorine-containing polymer (A) as the base material are also disclosed. CF2=CFCH2CH-Q-CH2CH=CH2 (1) In the above formula, Q represents (CH2)aC(CF3)2OR4 (wherein a is an integer of 0-3, and R4 represents an alkyl group having 20 or less carbon atoms which may have an ether oxygen atom, a fluorine-containing alkyl group, an alkoxycarbonyl group having 6 or less carbon atoms, or CH2R5 (wherein R5 is an alkoxycarbonyl group having 6 or less carbon atoms)), or (CH2)dCOOR6 (wherein d is 0 or 1, and R6 represents an hydrogen atom, an alkyl group having 20 or less carbon atoms or a fluorine-containing alkyl group).
(FR) L'invention concerne un polymère fluoré, qui comprend un groupe fonctionnel et présente une haute transparence, dans une gamme de longueurs d'onde étendue. L'invention concerne également une composition de résine constituée dudit polymère fluoré. Un polymère fluoré (A) comprend un motif monomère dans lequel un diène fluoré de la formule (1) (CF2=CFCH2CH-Q-CH2CH=CH2) est polymérisé. L'invention concerne en outre une méthode de production du polymère fluoré (A) et une composition de résine utilisant le polymère fluoré (A) comme matériau de base. Dans ladite formule, Q repésente (CH2)aC(CF3)2OR4 (où à est un entier compris entre 0 et 3; et R4 est un groupe alkyle qui présente au plus 20 atomes de carbone pouvant comporter un atome d'éther-oxygène; un groupe alkyle fluoré, et un groupe alcoxycarbonyle comportant au plus 6 atomes de carbone; ou CH2R5 (R5 étant un groupe alcoxycarbonyle comportant au plus 6 atomes de carbone)); ou (CH2)dCOOR6 (d étant 0 ou 1, et R6 représentant un atome d'hydrogène, un groupe alkyle présentant au plus 20 atomes de carbone ou un groupe alkyle fluoré).
(JA)  官能基を有し、幅広い波長領域で高い透明性を有する含フッ素ポリマーおよび該含フッ素ポリマーからなるレジスト用組成物を与えること。  下記式(1)で表される含フッ素ジエンが重合したモノマー単位を有する含フッ素ポリマー(A)、その製造方法および含フッ素ポリマー(A)をベ−スとするレジスト組成物。  CF=CFCHCH−Q−CHCH=CH・・・(1) ただし、Qは(CHC(CFOR(aは0~3の整数であり、Rエーテル性酸素原子を有してもよい炭素数20以下のアルキル基、含フッ素アルキル基、炭素数6以下のアルコキシカルボニル基またはCH(Rは炭素数6以下のアルコキシカルボニル基))、または(CHCOOR(dは0または1であり、Rは水素原子、炭素数20以下のアルキル基または含フッ素アルキル基)を表す。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)