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Machine translation
1. (WO2005010573) METHOD FOR PRODUCTION OF MICRO-OPTICS STRUCTURES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/010573    International Application No.:    PCT/IL2004/000678
Publication Date: 03.02.2005 International Filing Date: 25.07.2004
Chapter 2 Demand Filed:    23.05.2005    
IPC:
G02B 3/00 (2006.01)
Applicants: EXPLAY LTD. [IL/IL]; Huzot Shfaim, 2nd Floor, P.O.Box 12, 68990 Kibbutz Shfaim (IL) (For All Designated States Except US).
ZALEVSKY, Zeev [IL/IL]; (IL) (For US Only).
ECKHOUSE, Vardit [IL/IL]; (IL) (For US Only).
KAPELLNER, Yuval [IL/IL]; (IL) (For All Designated States Except US).
EYAL, Izhar [IL/IL]; (IL) (For US Only).
RUDNITSKY, Arkady [IL/IL]; (IL) (For US Only).
COHEN, Nadav [IL/IL]; (IL) (For US Only)
Inventors: ZALEVSKY, Zeev; (IL).
ECKHOUSE, Vardit; (IL).
EYAL, Izhar; (IL).
RUDNITSKY, Arkady; (IL).
COHEN, Nadav; (IL)
Agent: REINHOLD COHN AND PARTNERS; P.O. BOX 4060, 61040 TEL AVIV (IL)
Priority Data:
60/490,655 24.07.2003 US
Title (EN) METHOD FOR PRODUCTION OF MICRO-OPTICS STRUCTURES
(FR) PROCEDE DE PRODUCTION DE STRUCTURES DE MICRO-OPTIQUE
Abstract: front page image
(EN)A novel method for fabricating a micro-optics structure, having at least one lenslet array, is presented. A writing mask is provided being configured in accordance with an arrangement of the lenslet array to be manufactured. The writing mask is applied to a structure formed by a photosensitive layer of a predetermined thickness carried by a substrate, and the photosensitive layer is exposed through the writing mask using a predetermined spectral range of the exposure and a predetermined distance between the mask and said photosensitive layer, to thereby pattern the photosensitive layer through a diffractive optical element of said mask. The so-obtained pattern is in the form of optical nonhomogeneities in the photosensitive layer material, defining the lenslet array within the photosensitive layer.
(FR)L'invention concerne un nouveau procédé de fabrication de structures de micro-optique comportant au moins un réseau de lentilles. Ce procédé consiste à utiliser un masque d'écriture conçu conformément à une disposition du réseau de lentilles à fabriquer, à appliquer ce masque d'écriture à une structure constituée d'une couche photosensible d'une épaisseur prédéterminée reposant sur un substrat, puis à exposer cette couche photosensible à travers le masque d'écriture en utilisant un domaine spectral prédéterminé de l'exposition et une distance prédéterminée entre le masque et ladite couche photosensible, pour ainsi former un motif dans la couche photosensible par un élément optique de diffraction dudit masque. Le motif ainsi obtenu comprend des zones non homogènes optiques dans la couche photosensible définissant le réseau de lentilles dans la couche photosensible.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)