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1. (WO2005010062) POLYMERIZABLE UNSATURATED MONOMER CONTAINING FLUORINE ATOM, POLYMER COMPOUND CONTAINING FLUORINE ATOM AND RESIN COMPOSITION FOR PHOTORESIST
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2005/010062    International Application No.:    PCT/JP2004/008846
Publication Date: 03.02.2005 International Filing Date: 17.06.2004
IPC:
C08F 20/22 (2006.01)
Applicants: DAICEL CHEMICAL INDUSTRIES, LTD. [JP/JP]; 1, Teppo-cho, Sakai-shi, Osaka 5908501 (JP) (For All Designated States Except US).
KOYAMA, Hiroshi [JP/JP]; (JP) (For US Only).
TSUTSUMI, Kiyoharu [JP/JP]; (JP) (For US Only)
Inventors: KOYAMA, Hiroshi; (JP).
TSUTSUMI, Kiyoharu; (JP)
Agent: GOTO, Yukihisa; Masuda Bldg, 202, 7-16, Higashitenma 2-chome, Kita-ku, Osaka-shi, Osaka 5300044 (JP)
Priority Data:
2003-278627 23.07.2003 JP
2003-322602 16.09.2003 JP
Title (EN) POLYMERIZABLE UNSATURATED MONOMER CONTAINING FLUORINE ATOM, POLYMER COMPOUND CONTAINING FLUORINE ATOM AND RESIN COMPOSITION FOR PHOTORESIST
(FR) MONOMERE INSATURE POLYMERISABLE CONTENANT UN ATOME DE FLUOR, COMPOSE POLYMERE CONTENANT UN ATOME DE FLUOR ET COMPOSITION DE RESINE POUR PHOTORESINE
(JA) フッ素原子含有重合性不飽和単量体、フッ素原子含有高分子化合物及びフォトレジスト用樹脂組成物
Abstract: front page image
(EN)A polymerizable unsaturated monomer containing a fluorine atom represented by following formula (1a) or (1b): (1a) (1b) [wherein each of the rings Z1 and Z2 represents an alicyclic carbon ring, each of R1, R2 and R3 represents an alkyl group or a fluoroalkyl group, W represents a single bond or a connecting group, R represents a specific unsaturated acyl group, with the proviso that in the formula (1a), at least one of R1, R2 and the like is a fluorine atom or a fluoroalkyl group, and in the formula (1b), (i) a fluorine atom or a fluoroalkyl group is bonded to the rings Z2 or (ii) R3 is a fluoroalkyl group].
(FR)L'invention concerne un monomère insaturé polymérisable contenant un atome de fluor représenté par la formule (1a) ou (1b). Dans lesdites formules, chacun des noyaux Z1 et Z2 représente un noyau de carbone alicyclique, R1, R2 et R3 représentent chacun un groupe alkyle ou un groupe fluoroalkyle, W représente une liaison unique ou un groupe de liaison, R représente un groupe acyle insaturé spécifique, à condition que dans la formule (1a), au moins l'un des éléments R1, R2 et analogues soit un atome de fluor ou un groupe fluoroalkyle, et dans la formule (1b), (i) un atome de fluor ou un groupe fluoroalkyle soit lié aux noyaux Z2 ou (ii) R3 soit un groupe fluoroalkyle.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)