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1. (WO2005001572) LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2005/001572 International Application No.: PCT/EP2004/006875
Publication Date: 06.01.2005 International Filing Date: 25.06.2004
Chapter 2 Demand Filed: 26.01.2005
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
ASML NETHERLANDS B.V. [NL/NL]; De Run 6501 NL-5504 DR Veldhoven, NL (AllExceptUS)
KOLESNYCHENKO, Aleksey, Yurievich [UA/NL]; NL (UsOnly)
Inventors:
KOLESNYCHENKO, Aleksey, Yurievich; NL
VAN DER WERF, Jan, Evert; NL
Agent:
LEEMING, John, Gerard ; J.A. Kemp & Co. 14 South Square Gray's Inn London WC1R 5JJ, GB
Priority Data:
03254116.127.06.2003EP
Title (EN) LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
(FR) APPAREIL LITHOGRAPHIQUE ET PROCEDE DE FABRICATION DE DISPOSITIF
Abstract:
(EN) Liquid is supplied to a space between the final element of the projection system and the substrate, but there is a space between the liquid and the substrate. An evanescent field is formed between the liquid and the substrate allowing some photons to expose the substrate. Due to the refractive index of the liquid, the resolution of the system is improved and liquid on the substrate is avoided.
(FR) Un liquide est alimenté dans un espace entre l'élément final d'un système de projection et le substrat, mais il subsiste un espace entre le liquide et le substrat. Un champ évanescent est formé entre le liquide et le substrat permettant l'exposition du substrat par quelques photons. Grâce à l'indice de réfraction du liquide, la résolution du système est amélioré et la présence de liquide sur le substrat est évitée.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
JP2009514183JP4497551