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1. WO2004114356 - HIGH RESOLUTION SEPARATION MAGNET FOR RIBBON BEAM ION IMPLANTERS

Publication Number WO/2004/114356
Publication Date 29.12.2004
International Application No. PCT/US2004/015058
International Filing Date 14.05.2004
IPC
H01J 37/05 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
05Electron- or ion-optical arrangements for separating electrons or ions according to their energy
H01J 37/317 2006.1
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation
CPC
H01J 2237/0041
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
004Charge control of objects or beams
0041Neutralising arrangements
H01J 37/05
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
05Electron or ion-optical arrangements for separating electrons or ions according to their energy ; or mass
H01J 37/30
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
H01J 37/317
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
H01J 37/3171
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
30Electron-beam or ion-beam tubes for localised treatment of objects
317for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
3171for ion implantation
H01J 37/32082
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
32082Radio frequency generated discharge
Applicants
  • AXCELIS TECHNOLOGIES INC. [US]/[US] (AllExceptUS)
  • BENVENISTE, Victor [US]/[US] (UsOnly)
  • HUANG, Yongzhang [CN]/[US] (UsOnly)
Inventors
  • BENVENISTE, Victor
  • HUANG, Yongzhang
Priority Data
10/606,08725.06.2003US
60/470,92615.05.2003US
Publication Language English (en)
Filing Language English (EN)
Designated States
Title
(EN) HIGH RESOLUTION SEPARATION MAGNET FOR RIBBON BEAM ION IMPLANTERS
(FR) AIMANT DE SEPARATION HAUTE RESOLUTION POUR DISPOSITIFS D'IMPLANTATION DE FAISCEAUX IONIQUES EN FORME DE RUBAN
Abstract
(EN) A mass analyzer for a ribbon shaped ion beam is disclosed. The mass analyzer comprises a pair of coils that define an entrance end and an exit end of the analyzer. Field clamps are employed at or proximate to one or more of the entrance and exit ends of the mass analyzer. The field clamps operate to terminate fringing fields close to the entrance and exit ends of the mass analyzer, thereby reducing the impact of such fringing fields on the ribbon beam and improving beam uniformity.
(FR) L'invention concerne un analyseur de masse pour faisceau ionique en forme de ruban. L'analyseur de masse comprend une paire de bobines définissant une extrémité d'entrée et une extrémité de sortie de l'analyseur. Des éléments de calage de champ sont utilisés au niveau ou près d'une ou des deux extrémités d'entrée et de sortie de l'analyseur de masse. Les éléments de calage de champ complètent les champs de dispersion proches des extrémités d'entrée et de sortie de l'analyseur de masse, réduisant ainsi l'impact desdits champs de dispersion sur le faisceau en forme de ruban et améliorant l'uniformité du faisceau.
Latest bibliographic data on file with the International Bureau