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1. (WO2004102667) INTEGRATED CIRCUIT ARRANGEMENT COMPRISING ISOLATING TRENCHES AND A FIELD EFFECT TRANSISTOR, AND ASSOCIATED PRODUCTION METHOD
PCT Biblio. Data
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Pub. No.:
WO/2004/102667
International Application No.:
PCT/EP2004/050718
Publication Date:
25.11.2004
International Filing Date:
05.05.2004
Chapter 2 Demand Filed:
24.02.2005
IPC:
H01L 21/336
(2006.01),
H01L 21/8247
(2006.01),
H01L 27/115
(2006.01)
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
02
Manufacture or treatment of semiconductor devices or of parts thereof
04
the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer, carrier concentration layer
18
the devices having semiconductor bodies comprising elements of the fourth group of the Periodic System or A
III
B
V
compounds with or without impurities, e.g. doping materials
334
Multistep processes for the manufacture of devices of the unipolar type
335
Field-effect transistors
336
with an insulated gate
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
21
Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
70
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in or on a common substrate or of specific parts thereof; Manufacture of integrated circuit devices or of specific parts thereof
77
Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
78
with subsequent division of the substrate into plural individual devices
82
to produce devices, e.g. integrated circuits, each consisting of a plurality of components
822
the substrate being a semiconductor, using silicon technology
8232
Field-effect technology
8234
MIS technology
8239
Memory structures
8246
Read-only memory structures (ROM)
8247
electrically-programmable (EPROM)
H
ELECTRICITY
01
BASIC ELECTRIC ELEMENTS
L
SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
27
Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
02
including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
04
the substrate being a semiconductor body
10
including a plurality of individual components in a repetitive configuration
105
including field-effect components
112
Read-only memory structures
115
Electrically programmable read-only memories
Applicants:
INFINEON TECHNOLOGIES AG
[DE/DE]; St.-Martin-Str. 53, 81669 München (DE)
(For All Designated States Except US)
.
KAKOSCHKE, Ronald
[DE/DE]; (DE)
(For US Only)
.
SCHULER, Franz
[DE/DE]; (DE)
(For US Only)
Inventors:
KAKOSCHKE, Ronald
; (DE).
SCHULER, Franz
; (DE)
Agent:
KARL, Frank
; Patentanwälte Kindermann, P.O. Box 100234, 85593 Baldham (DE)
Priority Data:
103 21 742.8
14.05.2003
DE
Title
(DE)
INTEGRIERTE SCHALTUNGSANORDNUNG SOWIE HERSTELLUNGSVERFAHREN
(EN)
INTEGRATED CIRCUIT ARRANGEMENT COMPRISING ISOLATING TRENCHES AND A FIELD EFFECT TRANSISTOR, AND ASSOCIATED PRODUCTION METHOD
(FR)
CIRCUIT INTEGRE COMPRENANT UNE TRANCHEE D'ISOLATION ET UN TRANSISTOR A EFFET DE CHAMP ET PROCEDE DE PRODUCTION DE CE CIRCUIT
Abstract:
(DE)
Erläutert wird unter anderem eine Speicher-Schaltungsanordnung mit einem Speicherzellenbereich (12). Der Speicherzellenbereich (12) enthält eine Vielzahl von Speicherzellentransistoren (TOO bis T21). Speicherzellentransistoren (T00, T01) einer Spalte werden mit Hilfe eines Auswahltransistors (TD0) ausgewählt. Der Auswahltransistor (TD0) ist ein Dreifach-Steuerbereich-Transistor, dessen Steuerbereich sich bis in Isoliergräben (G0, G1) erstreckt. Die Isoliergräben (G0, G1) dienen auch zum Isolieren der Speicherzellentransistoren (T00, T10) verschiedener Spalten des Speicherzellenfeldes (12). Durch diese Anordnung lässt sich der Integrationsgrad weiter erhöhen.
(EN)
The invention relates to a memory circuit arrangement comprising a memory cell region (12) that contains a plurality of memory cell transistors (T00 to T21). The memory cell transistors (T00, T01) in a column are selected by means of a selection transistor (TD0). Said selection transistor (TD0) is a triple control-region transistor, whose control region extends as far as isolation trenches (G0, G1). The latter (G0, G1) also isolate the memory cell transistors (T00, T10) of different columns in the memory cell field (12). Said arrangement increases the level of integration.
(FR)
L'invention concerne un circuit de mémoire comprenant une zone de cellules de mémoire (12), laquelle contient une pluralité de transistors de cellules de mémoire (T00 à T21). Les transistors de cellules de mémoire (T00, T01) d'une colonne sont sélectionnés à l'aide d'un transistor de sélection (TD0). Ce transistor de sélection (TD0) est un transistor à zone de commande triple, la zone de commande s'étendant jusqu'aux tranchées d'isolation (G0, G1). Lesdites tranchées d'isolation (G0, G1) servent également à isoler les transistors de cellules de mémoire (T00, T10) de différentes colonnes du champ de cellules de mémoire (12). Cette configuration permet d'accroître davantage le degré d'intégration.
Designated States:
AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language:
German (
DE
)
Filing Language:
German (
DE
)