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1. (WO2004102646) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2004/102646 International Application No.: PCT/JP2004/006853
Publication Date: 25.11.2004 International Filing Date: 14.05.2004
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
株式会社ニコン NIKON CORPORATION [JP/JP]; 〒100-8331 東京都 千代田区 丸の内3丁目2番3号 Tokyo 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-8331, JP (AllExceptUS)
ISHII, Yuuki [JP/JP]; JP (UsOnly)
Inventors:
ISHII, Yuuki; JP
Agent:
志賀 正武 SHIGA, Masatake; 〒104-8453 東京都 中央区 八重洲2丁目3番1号 Tokyo 2-3-1, Yaesu Chuo-ku, Tokyo 104-8453, JP
Priority Data:
2003-13721415.05.2003JP
Title (EN) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
(FR) APPAREIL D'EXPOSITION ET PROCEDE DE FABRICATION DE DISPOSITIF
(JA) 露光装置及びデバイス製造方法
Abstract:
(EN) An exposure apparatus main body (EX) of a device manufacturing system (SYS) is disclosed wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system (PL) and the substrate (P) with a liquid (50) and projecting the pattern image of a mask (M) onto the substrate (P) through the projection optical system (PL) and the liquid (50). The exposure apparatus main body (EX) comprises a substrate holder (PH) for holding the substrate (P) and the liquid (50) so that the substrate (P) is immersed in the liquid (50) and a liquid supply mechanism (12) for supplying the liquid (50) onto the substrate (P) from the above in the vicinity of a projection area (AR1) of the projection optical system (PL). With this structure, the exposure apparatus enables to form a desired device pattern on a substrate even when an exposure is carried out while filling the space between a projection optical system and a substrate with a liquid.
(FR) L'invention concerne un corps principal d'appareil d'exposition (EX) de système de fabrication de dispositif (SYS). On réalise l'exposition d'un substrat (P) par remplissage d'au moins une partie de l'espace entre un système de projection optique (PL) et le substrat (P) avec un liquide (50), et projection de l'image de configuration d'un masque (M) sur le substrat (P) via ledit système (PL) et ledit liquide (50). Le corps principal (EX) considéré comprend un porte-substrat (PH) pour le substrat (P) et le liquide (50), de sorte que le substrat (P) soit immergé dans le liquide (50), et un mécanisme d'alimentation en liquide (12) fournissant le liquide (50) sur le substrat (P) depuis le dessus, au voisinage d'une zone de projection (AR1) du système (PL). Avec cette structure, l'appareil d'exposition permet de former la configuration de dispositif souhaitée sur un substrat même lorsque l'exposition s'effectue durant le remplissage en liquide de l'espace entre un système de projection optique et un substrat.
(JA) デバイス製造システムSYSの露光装置本体EXは、投影光学系PLと基板Pとの間の少なくとも一部を液体50で満たし、投影光学系PLと液体50とを介してマスクMのパターンの像を基板P上に投影して、基板Pを露光するものであって、基板Pを保持するとともに、基板Pが浸かるように液体50を保持する基板ホルダPHと、投影光学系PLの投影領域AR1の近傍で基板Pの上方から基板P上に液体50を供給する液体供給機構12とを備える。このような構成により、投影光学系と基板との間に液体を満たして露光処理する際にも所望のデバイスのパターンを基板上に形成可能な露光装置を提供することができる。
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)