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1. (WO2004099373) BIOCOMPATIBLE RESISTS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/099373    International Application No.:    PCT/US2004/013383
Publication Date: 18.11.2004 International Filing Date: 30.04.2004
IPC:
G03C 1/73 (2006.01), G03F 7/038 (2006.01), G03F 7/039 (2006.01), G03F 7/20 (2006.01), G03F 7/30 (2006.01)
Applicants: UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE [US/US]; 9201 University City Boulevard, Charlotte, North Carolina 28223 (US) (For All Designated States Except US).
GONSALVES, Kenneth, E. [US/US]; (US) (For US Only).
HE, Wei [CN/US]; (US) (For US Only)
Inventors: GONSALVES, Kenneth, E.; (US).
HE, Wei; (US)
Agent: CALKINS, Charles, W.; Kilpatrick Stockton, LLP, 1001 West Fourth Street, Winston-Salem, North Carolina 27101 (US)
Priority Data:
60/466,878 02.05.2003 US
Title (EN) BIOCOMPATIBLE RESISTS
(FR) RESERVES BIOCOMPATIBLES
Abstract: front page image
(EN)This invention relates to biomaterials, biocompatible photoresists, and electroactive photoresists, and methods to engineer the interactions between biomaterials and cells. In one aspect, this invention provides for modifying surface topography through micro-patterning techniques that require no organic solvent development to reveal the lithographic patterns. Cells can be cultured on these surfaces directly and exhibit strong cell alignment features.
(FR)L'invention concerne des biomatériaux, des photorésines biocompatibles et des photorésines électro-actives. L'invention concerne également des procédés permettant de créer des interactions entre des biomatériaux et des cellules. Dans un aspect, l'invention consiste à modifier la topographie de surface au moyen de techniques de micro-modélisation n'ayant pas recours au développement par solvant organique pour révéler des motifs lithographiques. Des cellules peuvent être cultivées directement sur ces surfaces et présenter de bonnes caractéristiques d'alignement cellulaire.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)