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Machine translation
1. (WO2004097522) NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/097522    International Application No.:    PCT/KR2004/000992
Publication Date: 11.11.2004 International Filing Date: 29.04.2004
IPC:
G03F 7/00 (2006.01), G03F 7/033 (2006.01)
Applicants: ADMS TECHNOLOGY CO. LTD. [KR/KR]; 459-3 Sindae-ri, Seo-myeon, Yeongi-gun, Chungcheongnam-do 339-811 (KR) (For All Designated States Except US).
KIM, Young-Keun [KR/KR]; (KR) (For US Only).
CHOI, Suk-Young [KR/KR]; (KR) (For US Only).
CHA, Hyuk-Jin [KR/KR]; (KR) (For US Only).
LEE, Jae-Hwan [KR/KR]; (KR) (For US Only).
LEE, Keun-Joo [KR/KR]; (KR) (For US Only).
RYU, Mi-Sun [KR/KR]; (KR) (For US Only).
PAE, You-Lee [KR/KR]; (KR) (For US Only).
SEO, Hyun-Jin [KR/KR]; (KR) (For US Only).
WOO, Seung-Woo [KR/KR]; (KR) (For US Only).
WOO, Je-Sun [KR/KR]; (KR) (For US Only).
YOO, Kwon-Yil [KR/KR]; (KR) (For US Only).
LEE, Su-Hyun [KR/KR]; (KR) (For US Only).
JEONG, Yong-Man [KR/KR]; (KR) (For US Only).
CHOI, Bum-Young [KR/KR]; (KR) (For US Only).
HAN, Cheol [KR/KR]; (KR) (For US Only).
KIM, Woong [KR/KR]; (KR) (For US Only).
JUNG, Nak-Chil [KR/KR]; (KR) (For US Only).
HONG, Seong-Jae [KR/KR]; (KR) (For US Only).
KIM, Min-Ji [KR/KR]; (KR) (For US Only).
CHOI, Young-Soo [KR/KR]; (KR) (For US Only).
JUNG, Sang-Hyup [KR/KR]; (KR) (For US Only).
CHOI, Jae-Lok [KR/KR]; (KR) (For US Only)
Inventors: KIM, Young-Keun; (KR).
CHOI, Suk-Young; (KR).
CHA, Hyuk-Jin; (KR).
LEE, Jae-Hwan; (KR).
LEE, Keun-Joo; (KR).
RYU, Mi-Sun; (KR).
PAE, You-Lee; (KR).
SEO, Hyun-Jin; (KR).
WOO, Seung-Woo; (KR).
WOO, Je-Sun; (KR).
YOO, Kwon-Yil; (KR).
LEE, Su-Hyun; (KR).
JEONG, Yong-Man; (KR).
CHOI, Bum-Young; (KR).
HAN, Cheol; (KR).
KIM, Woong; (KR).
JUNG, Nak-Chil; (KR).
HONG, Seong-Jae; (KR).
KIM, Min-Ji; (KR).
CHOI, Young-Soo; (KR).
JUNG, Sang-Hyup; (KR).
CHOI, Jae-Lok; (KR)
Agent: LEE, Sang-Yong; 4F., Byukcheon Bldg., 1597-5, Seocho-dong, Seocho-gu, Seoul 137-876 (KR)
Priority Data:
10-2003-0027860 30.04.2003 KR
Title (EN) NEGATIVE RESIST COMPOSITION FOR ORGANIC INSULATOR OF HIGH APERTURE LCD
(FR) COMPOSITION DE MATIERE DE PROTECTION NEGATIVE POUR ISOLANT ORGANIQUE DE LCD A GRANDE OUVERTURE
Abstract: front page image
(EN)A negative resist composition for an organic insulator of high aperture LCD is disclosed. The composition includes 5 ˜ 40 parts by weight of a binder resin selected from binder resins having the structures expressed by the formulas 1 and 2 and their mixture, 2 ˜ 200 parts by weight of a multifunctional monomer containing unsaturated aliphatic groups, and 0.005 ˜ 20 parts by weight of a photoinitiator. The negative resist composition shows good adhesion, UV transmittance, film retention, uniformity and pattern stability when an organic insulator of high aperture LCD is made.
(FR)La présente invention concerne une composition de matière de protection négative conçue pour un isolant organique de LCD à grande ouverture. Ladite composition contient 5 à 40 parts en poids d'une résine liante sélectionnée parmi des résines liantes ayant les structures exprimées par les formules 1 et 2 ainsi que leur mélange, 2 à 200 parts en poids d'un monomère multifonctionnel contenant des groupes aliphatiques insaturés, et 0,005 à 20 parts en poids d'un photo-amorceur. Cette composition de matière de protection négative présente de bonnes caractéristiques d'adhérence, de facteur de transmission des UV, de rétention sous forme de film, d'uniformité et de stabilité des motifs lors de la fabrication d'un isolant organique de LCD à grande ouverture.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, NA, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: Korean (KO)