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Machine translation
1. (WO2004097518) A METHOD OF FORMING STEPPED STRUCTURES EMPLOYING IMPRINT LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/097518    International Application No.:    PCT/US2004/012313
Publication Date: 11.11.2004 International Filing Date: 21.04.2004
IPC:
B81C 1/00 (2006.01), C03C 17/00 (2006.01), C03C 23/00 (2006.01)
Applicants: MOLECULAR IMPRINTS, INC. [US/US]; 1807-C West Braker Lane, Suite 100, Austin, TX 78758-3605 (US) (For All Designated States Except US)
Inventors: SREENIVASAN, Sidlgata, V.; (US)
Agent: BROOKS, Kenneth, C.; Molecular Imprints, Inc., Legal Department, P.O. Box 81536, Austin, TX 78708-1536 (US)
Priority Data:
10/423,642 25.04.2003 US
Title (EN) A METHOD OF FORMING STEPPED STRUCTURES EMPLOYING IMPRINT LITHOGRAPHY
(FR) PROCEDE DE FORMATION DE STRUCTURES ETAGEES PAR LITHOGRAPHIE NANO-IMPRINT
Abstract: front page image
(EN)The present invention provides a method for forming a stepped structure (34a, 34b, 34c) on a substrate (31) that features transferring into the substrate an inverse shape of the stepped structure disposed on the substrate.
(FR)L'invention porte sur un procédé de formation de structures étagées sur un substrat consistant à y créer la forme inverse de la structure étagée qu'on applique sur le substrat.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (BW, GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)