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1. (WO2004095498) HIGH-DENSITY PLASMA SOURCE USING EXCITED ATOMS
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2004/095498 International Application No.: PCT/US2004/010968
Publication Date: 04.11.2004 International Filing Date: 08.04.2004
IPC:
C23C 14/34 (2006.01) ,H01J 37/00 (2006.01) ,H01J 37/34 (2006.01)
Applicants: CHISTYAKOV, Roman[US/US]; US (UsOnly)
ZOND,INC[US/US]; 137A High Street Mansfield, Massachusetts 02048, US (AllExceptUS)
Inventors: CHISTYAKOV, Roman; US
Agent: RAUSCHENBACH, Kurt; P.O. BOX 387 Bedford, Massachusetts 07130, US
Priority Data:
10/249,59522.04.2003US
10/249,84412.05.2003US
Title (EN) HIGH-DENSITY PLASMA SOURCE USING EXCITED ATOMS
(FR) SOURCE DE PLASMA A DENSITE ELEVEE EMPLOYANT DES ATOMES EXCITES
Abstract: front page image
(EN) A plasma source which includes a cathode assembly (202) and an anode (226)positioned adjacent to the cathode assmebly. An excited atom source generates an initial plasma and excited atoms from a volume of feed gas. The initial plasma and excited atoms are located proximate to the cathode assembly. A power supply generates an electric field between the cathode assembly and the anode. The electric field super-ionizes the initial plasma so as to generate a high-density plasma.
(FR) La présente invention concerne une source de plasma. La source de plasma comprend un système cathodique. Une anode est adjacente au système cathodique. Une source d'atomes excités produit un plasma initial et des atomes excités à partir d'un volume de gaz d'alimentation. Le plasma initial et les atomes excités se trouvent à proximité du système cathodique. Une alimentation électrique produit un champ électrique entre le système cathodique et l'anode. Le champ électrique produit la super-ionisation du plasma initial de façon à produire un plasma à densité élevée.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NA, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)