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1. (WO2004053953) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2004/053953 International Application No.: PCT/JP2003/015666
Publication Date: 24.06.2004 International Filing Date: 08.12.2003
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-8331, JP (AllExceptUS)
NEI, Masahiro [JP/JP]; JP (UsOnly)
KOBAYASHI, Naoyuki [JP/JP]; JP (UsOnly)
ARAI, Dai [JP/JP]; JP (UsOnly)
OWA, Soichi [JP/JP]; JP (UsOnly)
Inventors:
NEI, Masahiro; JP
KOBAYASHI, Naoyuki; JP
ARAI, Dai; JP
OWA, Soichi; JP
Agent:
KAWAKITA, Kijuro; YKB Mike Garden 5-4, Shinjuku 1-chome Shinjuku-ku, Tokyo 160-0022, JP
Priority Data:
2002-35795810.12.2002JP
2003-29649120.08.2003JP
Title (EN) EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
(FR) APPAREIL D'EXPOSITION ET SON PROCEDE DE FABRICATION
(JA) 露光装置及びデバイス製造方法
Abstract:
(EN) An exposure apparatus, wherein an exposure of a substrate (P) is carried out by locally filling the image plane side of a projection optical system (PL) with a liquid (50) and projecting an image of a pattern onto the substrate (P) through the projection optical system (PL) and the liquid (50), comprises a recovery unit (20) for recovering the liquid (50) flowed out of the substrate (P). With this apparatus, an accurate pattern transfer can be attained by suppressing environmental variations even when a liquid flows out of a substrate during exposure by an immersion method.
(FR) L'invention porte sur un appareil d'exposition dans lequel l'exposition d'un substrat (P) est effectuée par remplissage local du côté du plan d'image d'un système optique de projection (PL) avec un liquide (50) et par projection d'une image d'un motif sur le substrat (P) au moyen du système optique de projection (PL) et du liquide (50). Cet appareil comprend une unité de récupération (20) qui récupère le liquide (50) sortant du substrat (P). Avec cet appareil, le transfert du motif approprié peut être réalisé par suppression des variations environnementales lorsque le liquide sort d'un substrat pendant l'exposition selon un procédé d'immersion.
(JA)  露光装置は、投影光学系PLの像面側を局所的に液体50で満たし、液体50と投影光学系PLとを介してパターンの像を基板P上に投影することによって、基板Pを露光するものであって、基板Pの外側に流出した液体50を回収する回収装置20を備えている。液浸法で露光処理する場合に、基板の外側に液体が流出しても環境変動を抑えて精度良くパターン転写できる。
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Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BW, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)