WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Options
Query Language
Stem
Sort by:
List Length
Some content of this application is unavailable at the moment.
If this situation persist, please contact us atFeedback&Contact
1. (WO2004051717) ILLUMINATION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.: WO/2004/051717 International Application No.: PCT/JP2003/015447
Publication Date: 17.06.2004 International Filing Date: 02.12.2003
IPC:
G03F 7/20 (2006.01)
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants: TANITSU, Osamu[JP/JP]; JP (UsOnly)
TANAKA, Hirohisa[JP/JP]; JP (UsOnly)
MURAMATSU, Kenichi[JP/JP]; JP (UsOnly)
KOMINE, Norio[JP/JP]; JP (UsOnly)
NISHINAGA, Hisashi[JP/JP]; JP (UsOnly)
MATSUYAMA, Tomoyuki[JP/JP]; JP (UsOnly)
KUDO, Takehito[JP/JP]; JP (UsOnly)
NIKON CORPORATION[JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-8331, JP (AllExceptUS)
Inventors: TANITSU, Osamu; JP
TANAKA, Hirohisa; JP
MURAMATSU, Kenichi; JP
KOMINE, Norio; JP
NISHINAGA, Hisashi; JP
MATSUYAMA, Tomoyuki; JP
KUDO, Takehito; JP
Agent: YAMAGUCHI, Takao; Daiichi Bldg. 10, Kanda-tsukasacho 2-chome Chiyoda-ku, Tokyo 101-0048, JP
Priority Data:
2002-35118603.12.2002JP
2003-20107924.07.2003JP
2003-33844729.09.2003JP
Title (EN) ILLUMINATION OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
(FR) SYSTEME OPTIQUE D'ECLAIRAGE, SYSTEME D'EXPOSITION ET PROCEDE D'EXPOSITION
(JA) 照明光学装置、露光装置および露光方法
Abstract:
(EN) An illumination optical system for, when installed in an exposure system, realizing an adequate illumination condition by varying the polarized state of the illumination light according to the pattern characteristics of the mask while suppressing the loss of the intensity of light. The illumination optical system has a light source unit (1) for supplying a linearly polarized light for illuminating surfaces (M, W) to be illuminated therewith and polarized state changing means (10, 20) for changing the polarized state of the illuminating light from a specific polarized state to a nonpolarized state and vice versa. The polarized state changing means are arranged in the optical path between the light source unit and the surfaces to be illuminated. The polarized state changing means can be removed from the illumination optical path and has a depolarizer (20) for depolarizing the incident linearly polarized light as necessary.
(FR) L'invention porte sur un système optique d'éclairage, qui installé dans un système d'exposition fournit les conditions adéquates d'éclairage en faisant varier la polarisation de la lumière d'une source en fonction des caractéristiques des motifs d'un masque, tout en en supprimant les pertes d'intensité. Le système optique d'éclairage comporte: une source de lumière (1) fournissant une lumière polarisée linéairement éclairant les surfaces (M, W) devant l'être; et des moyens (10, 20) de modulation de la polarisation de la lumière entre un état de polarisation donné et un état de non polarisation, et vice versa. Les moyens (10, 20), qui sont placés sur la trajectoire optique entre la source de lumière et la surface à éclairer, peuvent en être retirés, et comportent un dépolariseur (20) pouvant si nécessaire dépolariser la lumière incidente polarisée linéairement.
(JA) たとえば露光装置に搭載された場合に、マスクのパターン特性に応じて光量損失を抑えつつ照明光の偏光状態を変化させて適切な照明条件を実現することのできる照明光学装置。直線偏光の光を供給する光源部(1)を有し、光源部からの光で被照射面(M,W)を照明する照明光学装置。光源部と被照射面との間の光路中に配置されて、被照射面を照明する光の偏光状態を特定の偏光状態と非偏光状態との間で切り換えるための偏光状態切換手段(10,20)を備えている。偏光状態切換手段は、照明光路に対して挿脱自在に構成されて、入射する直線偏光の光を必要に応じて非偏光化するためのデポラライザ(20)を備えている。
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (BW, GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Office (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (EPO) (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)