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1. WO2004038059 - TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION

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Publication Number WO/2004/038059
Publication Date 06.05.2004
International Application No. PCT/US2003/033879
International Filing Date 24.10.2003
Chapter 2 Demand Filed 24.05.2004
IPC
B22F 3/15 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
22CASTING; POWDER METALLURGY
FWORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
3Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor
12Both compacting and sintering
14simultaneously
15Hot isostatic pressing
B23K 20/14 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
20Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
14Preventing or minimising gas access, or using protective gases or vacuum during welding
B23K 20/16 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
20Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
16with interposition of special material to facilitate connection of the parts, e.g. material for absorbing or producing gas
B29C 67/00 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
67Shaping techniques not covered by groups B29C39/-B29C65/93
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
C23C 14/35 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
35by application of a magnetic field, e.g. magnetron sputtering
CPC
C23C 14/3407
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
3407Cathode assembly for sputtering apparatus, e.g. Target
H01J 37/3423
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3414Targets
3423Shape
H01J 37/3426
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3414Targets
3426Material
H01J 37/3435
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
32Gas-filled discharge tubes, ; e.g. for surface treatment of objects such as coating, plating, etching, sterilising or bringing about chemical reactions
34operating with cathodic sputtering
3411Constructional aspects of the reactor
3435Target holders (includes backing plates and endblocks)
Applicants
  • HONEYWELL INTERNATIONAL INC [US]/[US] (AllExceptUS)
  • STROTHERS, Susan [US]/[US] (UsOnly)
  • HORT, Werner [US]/[US] (UsOnly)
  • MCNEIL, Frederick [US]/[US] (UsOnly)
Inventors
  • STROTHERS, Susan
  • HORT, Werner
  • MCNEIL, Frederick
Agents
  • THOMPSON, Sandra, P.
  • CRISS, Roger
Priority Data
60/421,47824.10.2002US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) TARGET DESIGNS AND RELATED METHODS FOR ENHANCED COOLING AND REDUCED DEFLECTION AND DEFORMATION
(FR) CONCEPTIONS DE CIBLES ET PROCEDES ASSOCIES PERMETTANT UN REFROIDISSEMENT AMELIORE AINSI QU'UNE DEFLEXION ET UNE DEFORMATION REDUITES
front page image
Abstract
(EN)
A sputtering target is described herein that comprises: a) a target surface component comprising a target material; b) a core backing component having a coupling surface and a back surface, wherein the coupling surface is coupled to the target surface component; and c) at least one surface area feature coupled to or located in the back surface of the core backing component, wherein the surface area feature increases the effective surface area of the core backing component. Additional sputtering targets comprises: a) an integrated target surface component and core backing component, wherein the surface component and the backing component comprise the same target material or a material gradient; and b) at least one surface area feature that is on or integrated into the core backing component, wherein the surface area feature increases the effective component of the core backing component. Methods of forming a sputtering target are also described that comprise: a) providing a target surface component comprising a surface material; b) providing a core backing component comprising a backing material and having a coupling surface and a back surface; c) providing at least one surface area feature coupled to or located in the back surface of the core backing plate, wherein the surface area feature increases the effective surface area of the core backing plate or providing at least one surface area feature coupled to or located in the coupling surface of the core backing component, wherein the surface area feature increases the effective surface area of the core backing component; and d) coupling the surface target material to the coupling surface of the core backing material.
(FR)
L'invention concerne une cible de pulvérisation comprenant: a) un constituant de surface de cible comprenant un matériau de cible; b) un constituant de support de coeur présentant une surface de liaison ainsi qu'une surface arrière, la surface de liaison est couplée au constituant de surface de la cible; et c) au moins une caractéristique de surface couplée à ou située dans la surface arrière du constituant de support du coeur, la caractéristique de surface augmentant la surface utile du constituant de support du coeur. D'autres cibles de pulvérisation comprennent: a) un constituant de surface de cible et un constituant de support du coeur intégrés, le constituant de surface et le constituant de support comprennent le même matériau de cible ou un gradient de matériau; et b) au moins une caractéristique de surface se trouvant sur ou intégrée dans le constituant de support du coeur, la caractéristique de surface augmente la composante utile du constituant de support du coeur. L'invention concerne également des procédés de formation d'une cible de pulvérisation consistant: a) à fournir un constituant de surface de cible contenant un matériau de surface; b) à fournir un constituant de support du coeur comprenant un matériau de support et présentant une surface de liaison ainsi qu'une surface arrière; c) à fournir au moins une caractéristique de surface couplée à ou située dans la surface arrière de la plaque de support du coeur, la caractéristique de surface augmentant la surface utile de la plaque de support du coeur ou fournissant au moins une caractéristique de surface couplée à ou située dans la surface de liaison du constituant de support du coeur, la caractéristique de surface augmentant la surface utile du constituant de support du coeur et d) à unir le matériau de surface de la cible à la surface de liaison du matériau de support du coeur.
Also published as
AU2003301622
CN1751137
EP1583852
JP2006503984
KR1020050073580
US20070141857
US2007141857
Latest bibliographic data on file with the International Bureau
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