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1. (WO2004035567) HIGH PURITY ONDANSETRON HYDROCHLORIDE DIHYDRATE AND PROCESS FOR ITS SYNTHESIS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/035567    International Application No.:    PCT/HU2003/000081
Publication Date: 29.04.2004 International Filing Date: 16.10.2003
Chapter 2 Demand Filed:    13.05.2004    
IPC:
C07D 403/06 (2006.01), C07D 521/00 (2006.01)
Applicants: RICHTER GEDEON VEGYÉSZETI GYÁR RT. [HU/HU]; Gyömrõi ut 19-21, H-1103 Budapest (HU) (For All Designated States Except US).
CZIBULA, László [HU/HU]; (HU) (For US Only).
DOBAY, László [HU/HU]; (HU) (For US Only).
WERKNÉ PAPP, Éva [HU/HU]; (HU) (For US Only).
NAGYNÉ BAGDY, Judit [HU/HU]; (HU) (For US Only).
DEUTSCHNÉ JUHÁSZ, Ida [HU/HU]; (HU) (For US Only).
ÜBERHARDT, Tamásné [HU/HU]; (HU) (For US Only).
TERDY, László [HU/HU]; (HU) (For US Only).
HEGEDÛS, István [HU/HU]; (HU) (For US Only).
TÓTH, Géza [HU/HU]; (HU) (For US Only).
OLÁH, Ruben [HU/HU]; (HU) (For US Only)
Inventors: CZIBULA, László; (HU).
DOBAY, László; (HU).
WERKNÉ PAPP, Éva; (HU).
NAGYNÉ BAGDY, Judit; (HU).
DEUTSCHNÉ JUHÁSZ, Ida; (HU).
ÜBERHARDT, Tamásné; (HU).
TERDY, László; (HU).
HEGEDÛS, István; (HU).
TÓTH, Géza; (HU).
OLÁH, Ruben; (HU)
Common
Representative:
RICHTER GEDEON VEGYÉSZETI GYÁR RT.; Gyömrõi ut 19-21, H-1103 Budapest (HU)
Priority Data:
P 0203547 17.10.2002 HU
Title (EN) HIGH PURITY ONDANSETRON HYDROCHLORIDE DIHYDRATE AND PROCESS FOR ITS SYNTHESIS
(FR) DIHYDRATE D'HYDROCHLORURE D'ONDANSETRON EXTREMEMENT PUR ET SA METHODE DE SYNTHESE
Abstract: front page image
(EN)The invention relates to high purity ondansetron hydrochloride dihydrate containing not more than 0.10 w/w % chemical impurities as well as to the process for its synthesis.
(FR)L'invention concerne un dihydrate d'hydrochlorure d'ondansetron extrêmement pur ne contenant pas plus de 0,10 % en poids d'impuretés chimiques, ainsi que la méthode servant à en effectuer la synthèse.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)