WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2004034445) A METHOD FOR PLASMA ETCHING PERFORMANCE ENHANCEMENT
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/034445    International Application No.:    PCT/US2003/031712
Publication Date: 22.04.2004 International Filing Date: 06.10.2003
IPC:
H01L 21/311 (2006.01), H01L 21/768 (2006.01)
Applicants: LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway, Fremont, CA 94538 (US) (For All Designated States Except US).
HUANG, Zhisong [US/US]; (US) (For US Only).
LI, Lumin [US/US]; (US) (For US Only).
SADJADI, Reza [US/US]; (US) (For US Only)
Inventors: HUANG, Zhisong; (US).
LI, Lumin; (US).
SADJADI, Reza; (US)
Agent: OLYNICK, Mary, R.; Beyer Weaver & Thomas, LLP, P.O Box 70250, Oakland, CA 94612-0250 (US)
Priority Data:
60/417,806 11.10.2002 US
10/295,601 14.11.2002 US
10/674,675 29.09.2003 US
Title (EN) A METHOD FOR PLASMA ETCHING PERFORMANCE ENHANCEMENT
(FR) PROCEDE POUR AMELIORER UN RENDEMENT DE GRAVURE AU PLASMA
Abstract: front page image
(EN)A method for etching a feature in a layer through an etching mask is provided. A protective layer is formed on exposed surfaces of the etching mask and vertical sidewalls of the feature with a passivation gas mixture. The feature is etched through the etching mask with reactive etching mixtures containing at least one etching chemical and at least one passivation chemical.
(FR)L'invention concerne un procédé de gravure d'un dessin dans une couche, au travers d'un masque de gravure. Une couche de protection est formée sur des surfaces exposées du masque de gravure et sur des parois verticales latérales du dessin à l'aide d'un mélange gazeux de passivation. Le dessin est gravé au travers du masque de gravure à l'aide de mélanges de gravure réactifs contenant au moins un produit chimique de gravure et au moins un produit chimique de passivation.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)