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1. (WO2004031867) SYSTEM AND METHOD FOR HOLOGRAPHIC FABRICATION AND REPLICATION OF DIFFRACTIVE OPTICAL ELEMENTS FOR MASKLESS LITHOGRAPHY
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/031867    International Application No.:    PCT/US2003/031343
Publication Date: 15.04.2004 International Filing Date: 02.10.2003
IPC:
G03F 1/00 (2006.01), G03F 7/00 (2006.01), G03F 7/20 (2006.01), G03H 1/00 (2006.01)
Applicants: MASSACHUSETTS INSITUTE OF TECHNOLOGY [US/US]; 77 Massachusetts Avenue, Cambridge, MA 02139 (US)
Inventors: MENON, Rajesh; (US).
GIL, Dario; (US).
CARTER, David; (US).
BARBASTATHIS, George; (US).
SMITH, Henry, I.; (US)
Agent: CONNORS, Matthew, E.; Samuels, Gauthier & Stevens, LLP, 225 Franklin Street, Suite 3300, Boston, MA 02110 (US)
Priority Data:
60/415,720 03.10.2002 US
Title (EN) SYSTEM AND METHOD FOR HOLOGRAPHIC FABRICATION AND REPLICATION OF DIFFRACTIVE OPTICAL ELEMENTS FOR MASKLESS LITHOGRAPHY
(FR) SYSTEME ET PROCEDE POUR LA FABRICATION ET LA REPRODUCTION HOLOGRAPHIQUE D'ELEMENTS OPTIQUES DIFFRACTIFS DESTINES A LA LITHOGRAPHIE SANS MASQUE
Abstract: front page image
(EN)A method is disclosed for forming an array of focusing elements for use in a lithography system. In accordance with an embodiment, the method includes the steps of providing a master element that includes at least one diffractive pattern at a first location with respect to a target surface, illuminating the master element to produce a first diffractive pattern on the target surface at the first location, moving the master element with respect to the target surface to a second location with respect to the target surface, and illuminating the master element to produce a second diffractive pattern on the target surface at the second location.
(FR)L'invention concerne un procédé pour la réalisation d'un réseau d'éléments de focalisation destinés à un système de lithographie. Selon une variante, le procédé consiste à fournir un élément maître qui comprend au moins un motif diffractif en un premier point par rapport à une surface cible, à éclairer cet élément pour produire un premier motif diffractif sur la surface cible, au premier point considéré, à déplacer ledit élément par rapport à la surface cible, vers un second point par rapport à la surface en question, et à éclairer l'élément pour produire un second motif diffractif sur la surface cible, au second point.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)