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1. (WO2004031251) PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION AND OPTICAL WAVEGUIDE
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/031251    International Application No.:    PCT/JP2003/012479
Publication Date: 15.04.2004 International Filing Date: 30.09.2003
Chapter 2 Demand Filed:    13.04.2004    
IPC:
C08F 220/10 (2006.01), C08F 222/10 (2006.01), G02B 6/12 (2006.01), G02B 6/122 (2006.01), G02B 6/138 (2006.01)
Applicants: JSR CORPORATION [JP/JP]; 6-10, Tsukiji 5-chome, Chuo-ku, Tokyo 104-8410 (JP) (For All Designated States Except US).
TAKASE, Hideaki [JP/JP]; (JP) (For US Only).
ERIYAMA, Yuuichi [JP/JP]; (JP) (For US Only)
Inventors: TAKASE, Hideaki; (JP).
ERIYAMA, Yuuichi; (JP)
Agent: HIRATA, Naoyuki; HIRATA & ASSOCIATES, Takou Building Kudan 4F, 8-5, Iidabashi 2-chome, Chiyoda-ku, Tokyo 102-0072 (JP)
Priority Data:
2002-294148 07.10.2002 JP
2003-7477 15.01.2003 JP
2003-67039 12.03.2003 JP
2003-175696 20.06.2003 JP
Title (EN) PHOTOSENSITIVE RESIN COMPOSITION FOR OPTICAL WAVEGUIDE FORMATION AND OPTICAL WAVEGUIDE
(FR) COMPOSITION DE RESINE PHOTOSENSIBLE DESTINEE A LA FORMATION D'UN GUIDE D'ONDES OPTIQUE ET GUIDE D'ONDES OPTIQUE
(JA) 光導波路形成用感光性樹脂組成物および光導波路
Abstract: front page image
(EN)A photosensitive resin composition for optical waveguide formation which comprises the following ingredients (A), (B), and (C) as components. This composition is excellent in suitability for patterning, refractive index, heat resistance, transmission characteristic, etc. (A) A di(meth)acrylate having a structure represented by the following general formula (1): (1) (wherein R1 represents -(OCH2CH2)m-, etc.; X represents -C(CH3)2-, etc.; Y represents hydrogen or halogeno; and m is an integer of 0 to 4); (B) a mono(meth)acrylate having a structure represented by the following general formula (2): (2) (wherein R2 represents -(OCH2CH2)p-, etc.; Y represents hydrogen, halogeno, Ph, etc.; and p is an integer of 0 to 4; provided that Ph represents phenyl); and (C) a free-radical photopolymerization initiator.
(FR)L'invention concerne une composition de résine photosensible destinée à la formation d'un guide d'ondes optique, comprenant les composants (A), (B) et (C) suivants, à savoir : (A) un di(méth)acrylate ayant une structure représentée par la formule générale (1) (dans laquelle R1 désigne (OCH2CH2)m-, etc. ; X désigne C(CH3)2-, etc. ; Y désigne un hydrogène ou un halogéno ; et m désigne un entier compris entre 0 et 4) ; (B) un mono(méth)acrylate ayant une structure représentée par la formule générale (2) (dans laquelle R2 désigne (OCH2CH2)p-, etc. ; Y désigne un hydrogène, un halogéno, Ph, etc. ; et p désigne un entier compris entre 0 et 4 ; à condition que Ph représente un phényle) ; et (C) un initiateur de photopolymérisation radicalaire.
(JA)not available
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)