Search International and National Patent Collections

1. (WO2004030016) METHOD FOR TOOLMATCHING AND TROUBLESHOOTING A PLASMA PROCESSING SYSTEM

Pub. No.:    WO/2004/030016    International Application No.:    PCT/US2003/030426
Publication Date: Apr 8, 2004 International Filing Date: Sep 26, 2003
IPC: H01J 37/32
Applicants: LAM RESEARCH CORPORATION
AVOYAN, Armen
JAFARIAN-TEHRANI, Seyed, Jafar
Inventors: AVOYAN, Armen
JAFARIAN-TEHRANI, Seyed, Jafar
Title: METHOD FOR TOOLMATCHING AND TROUBLESHOOTING A PLASMA PROCESSING SYSTEM
Abstract:
A method tests a plasma processing system having a chamber, an RF power source, and a matching network. An RF power signal is generated from the RF power source to the chamber without igniting any plasma within the chamber. The voltage of the RF power signal, the current of the RF power signal, and the phase of the RF power signal, received by the chamber is measured while holding other parameters affecting the chamber constant. A value representative of an impedance of the chamber is computed based on the voltage, the current, and the phase. The value is then compared with a reference value to determine any defects in the plasma processing system. The reference value is representative of the impedance of a defect-free chamber.