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1. (WO2004028815) METHOD FOR MANUFACTURING ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGE HEAD, METHOD FOR MANUFACTURING NOZZLE PLATE, METHOD FOR DRIVING ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGE HEAD, ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGING APPARATUS, AND LIQUID DISCHARGING APPARATUS
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/028815    International Application No.:    PCT/JP2003/012101
Publication Date: 08.04.2004 International Filing Date: 22.09.2003
IPC:
B05B 5/025 (2006.01), B05B 17/06 (2006.01), B41J 2/06 (2006.01), B41J 2/14 (2006.01), B41J 2/16 (2006.01)
Applicants: KONICA MINOLTA HOLDINGS, INC. [JP/JP]; 6-1, Marunouchi 1-chome, Chiyoda-ku, Tokyo 100-0005 (JP) (For All Designated States Except US).
SHARP KABUSHIKI KAISHA [JP/JP]; 22-22, Nagaike-cho, Abeno-ku, Osaka-shi, Osaka 545-8522 (JP) (For All Designated States Except US).
NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY [JP/JP]; 3-1, Kasumigaseki 1-chome, Chiyoda-ku, Tokyo 100-8921 (JP) (For All Designated States Except US).
NISHI, Yasuo [JP/JP]; (JP) (For US Only).
HIGUCHI, Kaoru [JP/JP]; (JP) (For US Only).
MURATA, Kazuhiro [JP/JP]; (JP) (For US Only).
YOKOYAMA, Hiroshi [JP/JP]; (JP) (For US Only)
Inventors: NISHI, Yasuo; (JP).
HIGUCHI, Kaoru; (JP).
MURATA, Kazuhiro; (JP).
YOKOYAMA, Hiroshi; (JP)
Agent: ARAFUNE, Hiroshi; 5F, Nikko Kagurazaka Bldg., 18, Iwatocho, Shinjuku-ku, Tokyo 162-0832 (JP)
Priority Data:
2002-278230 24.09.2002 JP
2002-278233 24.09.2002 JP
2002-278235 24.09.2002 JP
2002-278246 24.09.2002 JP
2003-293068 13.08.2003 JP
2003-293082 13.08.2003 JP
2003-293088 13.08.2003 JP
2003-293418 14.08.2003 JP
Title (EN) METHOD FOR MANUFACTURING ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGE HEAD, METHOD FOR MANUFACTURING NOZZLE PLATE, METHOD FOR DRIVING ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGE HEAD, ELECTROSTATIC ATTRACTION TYPE LIQUID DISCHARGING APPARATUS, AND LIQUID DISCHARGING APPARATUS
(FR) PROCEDE DE PRODUCTION D'UNE TETE DISTRIBUANT DU LIQUIDE DU TYPE A ATTRACTION ELECTROSTATIQUE, PROCEDE DE PRODUCTION D'UNE PLAQUE A BUSES, PROCEDE DE COMMANDE D'UNE TETE DISTRIBUANT DU LIQUIDE DU TYPE A ATTRACTION ELECTROSTATIQUE, APPAREIL DISTRIBUANT DU LIQUIDE DU TYPE A ATTRACTION ELECTROSTATIQUE ET APPAREIL DISTRIBUANT DU
(JA) 静電吸引型液体吐出ヘッドの製造方法、ノズルプレートの製造方法、静電吸引型液体吐出ヘッドの駆動方法、静電吸引型液体吐出装置及び液体吐出装置
Abstract: front page image
(EN)A plurality of electrodes (142) are formed on a substrate (141) through a film-forming process, a photolithography process and an etching process. Then, a resist layer (143b) is so formed over the substrate (141) as to cover the entire bodies of the electrodes (142). By exposing and developing the resist layer (143b), the resist layer (143b) is formed into nozzles (103) which stand on the substrate (141), correspond to the respective electrodes (142) and have very small diameters. A flow passage (145) is also formed within each nozzle (103).
(FR)Dans la présente invention, une pluralité d'électrodes (142) sont formées sur un substrat (141) au moyen d'un procédé de formation de film, d'un procédé de photolithographie et d'un procédé de gravure. Une couche de réserve (143b) est ensuite formée sur le substrat (141) de manière à recouvrir la totalité des corps des électrodes (142). L'exposition et la formation de la couche de réserve (143b) a pour effet de créer des buses (103) qui se situent sur le substrat (141), correspondent aux électrodes respectives (142) et présentent de très petits diamètres. Un passage d'écoulement (145) est également formé dans chaque buse (103).
(JA) まず、成膜工程、フォトリソグラフィー工程及びエッチング工程を経て基板141上に複数の電極142,142,…を形成する。次に、電極142,142,…全体を被覆するようにして基板141上にレジスト層143bを形成し、レジスト層143bを露光・現像することによって、レジスト層143bをそれぞれの電極142に対応させて基板141に対して立設した超微小径のノズル103に形成するとともに、それぞれのノズル103内にノズル内流路145を形成する。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)