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Machine translation
1. (WO2004027519) DUMMY PATTERNS FOR REDUCING PROXIMITY EFFECTS AND METHOD OF USING SAME
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/027519    International Application No.:    PCT/EP2003/009879
Publication Date: 01.04.2004 International Filing Date: 05.09.2003
Chapter 2 Demand Filed:    25.03.2004    
IPC:
G03F 1/00 (2012.01), G03F 1/36 (2012.01)
Applicants: INFINEON TECHNOLOGIES AG [DE/DE]; St. Martin-Strasse 53, 81669 München (DE)
Inventors: COMMONS, Martin; (US).
KLEE, Veit; (US).
MONO, Tobias; (DE).
WENSLEY, Paul; (US)
Agent: KARL, Frank; Patentanwälte Kindermann, Postfach 1330, 85627 Grasbrunn (DE).
KINDERMANN, Peter; Patentanwälte Kindermann, Postfach 1330, 85627 Grasbrunn (DE)
Priority Data:
10/247,204 19.09.2002 US
Title (EN) DUMMY PATTERNS FOR REDUCING PROXIMITY EFFECTS AND METHOD OF USING SAME
(FR) GABARITS FACTICES POUR REDUIRE LES EFFETS DE PROXIMITE, ET PROCEDE D'UTILISATION DESDITS GABARITS
Abstract: front page image
(EN)Disclosed is an optical lithographic mask having one or more dummy patterns, each said dummy pattern having a masked area of said optical lithographic mask seperated from one or more feature masked areas on said optical lithographic mask by an unmasked region of width d, wherein said width d is selected to substantially minimize an average deviation between the dimensions of said feature masked areas and corresponding features etched out upon a semiconductor surface utilizing said optical lithographic mask.
(FR)L'invention concerne un masque photolithographique, qui comprend un ou plusieurs gabarits factices présentant chacun une zone masquée séparée d'une ou de plusieurs zones masquées d'éléments par une zone non masquée de largeur d. Cette largeur d est choisie pour minimiser sensiblement un écart moyen entre les dimensions de ces zones masquées d'éléments et des éléments corespondants gravés à la surface d'un semi-conducteur au moyen dudit masque photolithographique.
Designated States: SG.
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR).
Publication Language: English (EN)
Filing Language: English (EN)