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1. WO2004023069 - MEASUREMENT AND COMPENSATION OF ERRORS IN INTERFEROMETRS

Publication Number WO/2004/023069
Publication Date 18.03.2004
International Application No. PCT/US2003/028587
International Filing Date 09.09.2003
IPC
G01B 9/02 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers
G01B 11/30 2006.01
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
30for measuring roughness or irregularity of surfaces
CPC
G01B 11/306
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
11Measuring arrangements characterised by the use of optical means
30for measuring roughness or irregularity of surfaces
306for measuring evenness
G01B 2290/45
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
2290Aspects of interferometers not specifically covered by any group under G01B9/02
45Multiple detectors for detecting interferometer signals
G01B 9/02021
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02015characterised by a particular beam path configuration
02017contacting one object several times
02021contacting different faces of object, e.g. opposite faces
G01B 9/02027
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02015characterised by a particular beam path configuration
02027Two or more interferometric channels or interferometers
G01B 9/0207
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02055characterised by error reduction techniques
0207Error reduction by correction of the measurement signal based on independently determined error sources, e.g. using a reference interferometer
G01B 9/02084
GPHYSICS
01MEASURING; TESTING
BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
9Instruments as specified in the subgroups and characterised by the use of optical measuring means
02Interferometers ; for determining dimensional properties of, or relations between, measurement objects
02083characterised by particular signal processing and presentation
02084Processing in the Fourier or frequency domain when not imaged in the frequency domain
Applicants
  • ZYGO CORPORATION [US]/[US] (AllExceptUS)
  • HILL, Henry, A. [US]/[US] (UsOnly)
Inventors
  • HILL, Henry, A.
Agents
  • FEIGENBAUM, David, L.
Priority Data
60/409,28509.09.2002US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) MEASUREMENT AND COMPENSATION OF ERRORS IN INTERFEROMETRS
(FR) MESURE ET COMPENSATION D'ERREURS DANS DES INTERFEROMETRES
Abstract
(EN)
In general, in one aspect, the invention features a method for determining the location of an alignment mark on a stage including measuring a location, x1, of a stage along a first measurement axis using an interferometer, measuring a location, x2, of the stage along a second measurement axis substantially parallel to the first measurement axis, and determining a location of the alignment mark along a third axis substantially parallel to the first measurement axis based on x1, x2, and a correction term, &PSgr;3, calculated from predetermined information including information characterizing imperfections in the interferometer.
(FR)
L'invention concerne, en général, dans un mode de réalisation, un procédé permettant de déterminer l'emplacement d'un repère d'alignement sur une platine consistant à mesurer un emplacement, x1, d'une scène selon un premier axe de mesure au moyen d'un interféromètre, à mesurer un emplacement, x2, de la platine selon un deuxième axe de mesure sensiblement parallèle au premier axe de mesure, et à déterminer un emplacement du repère d'alignement le long d'un troisième axe sensiblement parallèle au premier axe de mesure basé sur x1, x2, et un terme correctif, <i>?</i>3, calculé à partir d'une information déterminée comprenant une information caractérisant des imperfections de l'interféromètre.
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