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1. (WO2004019128) PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME
Latest bibliographic data on file with the International Bureau

Pub. No.: WO/2004/019128 International Application No.: PCT/JP2003/010665
Publication Date: 04.03.2004 International Filing Date: 22.08.2003
IPC:
G02B 17/08 (2006.01) ,G03F 7/20 (2006.01)
G PHYSICS
02
OPTICS
B
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
17
Systems with reflecting surfaces, with or without refracting elements
08
Catadioptric systems
G PHYSICS
03
PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
F
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
7
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
20
Exposure; Apparatus therefor
Applicants:
NIKON CORPORATION [JP/JP]; 2-3, Marunouchi 3-chome Chiyoda-ku, Tokyo 100-8331, JP (AllExceptUS)
OMURA, Yasuhiro [JP/JP]; JP (UsOnly)
IKEZAWA, Hironori [JP/JP]; JP (UsOnly)
WILLIAMSON, David, M. [GB/GB]; GB (UsOnly)
Inventors:
OMURA, Yasuhiro; JP
IKEZAWA, Hironori; JP
WILLIAMSON, David, M.; GB
Agent:
HASEGAWA, Yoshiki ; SOEI PATENT AND LAW FIRM, Ginza First Bldg. 10-6, Ginza 1-chome Chuo-ku, Tokyo 104-0061, JP
Priority Data:
0311470.919.05.2003GB
2002-24292523.08.2002JP
Title (EN) PROJECTION OPTICAL SYSTEM AND METHOD FOR PHOTOLITHOGRAPHY AND EXPOSURE APPARATUS AND METHOD USING SAME
(FR) SYSTEME OPTIQUE DE PROJECTION ET PROCEDE ASSOCIE POUR LA PHOTOLITHOGRAPHIE, ET APPAREIL D'EXPOSITION ET PROCEDE ASSOCIE
Abstract:
(EN) Optical Projection System and Method for Photolithography. A lithographic immersion projection system and method for projecting an image at high resolution over a wide field of view. The projection system and method include a final lens which decreases the marginal ray angle of the optical path before light passes into the immersion liquid to impinge on the image plane.
(FR) L'invention concerne un système optique de projection et un procédé associé pour la photolithographie. Elle concerne également un système de projection par immersion lithographique et un procédé de projection d'une image à haute résolution sur un grand champ de vision. Le système de projection comprend une lentille terminale qui réduit l'angle de rayon marginal du chemin optique avant que la lumière entre dans le liquide d'immersion pour venir frapper le plan d'image.
front page image
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW
African Regional Intellectual Property Organization (ARIPO) (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG)
Publication Language: English (EN)
Filing Language: English (EN)
Also published as:
KR1020050035890EP1532489JP2005536775US20050248856US20080068573US20080068576
US20080068724US20080094696US20080049306US20080049336CN1668984AU2003256081