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1. (WO2004010577) ETCHING METHOD AND ARTICLE ETCHED MOLDED BY THAT METHOD
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/010577    International Application No.:    PCT/JP2003/008945
Publication Date: 29.01.2004 International Filing Date: 14.07.2003
IPC:
H03H 3/04 (2006.01), H03H 9/21 (2006.01)
Applicants: DAISHINKU CORPORATION [JP/JP]; 1389, Aza-Kono, Shinzaike, Hiraoka-cho, Kakogawa-shi, Hyogo 675-0194 (JP) (For All Designated States Except US).
SATO, Shunsuke [JP/JP]; (JP) (For US Only).
KODA, Naoki [JP/JP]; (JP) (For US Only).
FUKUTOMI, Shunsuke [JP/JP]; (JP) (For US Only).
SHIRAI, Takashi [JP/JP]; (JP) (For US Only)
Inventors: SATO, Shunsuke; (JP).
KODA, Naoki; (JP).
FUKUTOMI, Shunsuke; (JP).
SHIRAI, Takashi; (JP)
Agent: KURAUCHI, Giro; Sumitomoseimei Midosuji Bldg., 14-3, Nishitemma 4-chome, Kita-ku, Osaka-shi, Osaka 530-0047 (JP)
Priority Data:
2002-213738 23.07.2002 JP
Title (EN) ETCHING METHOD AND ARTICLE ETCHED MOLDED BY THAT METHOD
(FR) PROCEDE D'ATTAQUE CHIMIQUE ET ARTICLE GRAVE MOULE AU MOYEN DE CE PROCEDE
(JA) エッチング方法及びその方法によって成形されたエッチング成形品
Abstract: front page image
(EN)When a tuning fork type quartz wafer (1A) having trenches (11c, 12c) in the leg parts (11, 12) is formed by etching a quartz substrate (2), a machining precision of the trenches (11c, 12c) is enhanced in terms of the depth dimension by presetting the width dimension of the trenches (11c, 12c) utilizing an etching stop technology where the etching amount depends on the shape of an etching region. The depth dimension can be attained as designed by ensuring an etching time not shorter than a minimum necessary time.
(FR)Lors de la formation d'une tranche de quartz (1A) de type à fourche ayant des tranchées (11c, 12c) pratiquées dans les parties jambe (11, 12) par la gravure d'un substrat de quartz (2), on améliore la précision de l'usinage des tranchées (11c, 12c) en termes de dimension de profondeur par la prédéfinition de la dimension de largeur des tranchées (11c, 12c) à l'aide d'une technologie d'arrêt de gravure, au cours de laquelle la quantité de gravure dépend de la forme d'une zone de gravure. On peut obtenir la dimension de gravure décrite en garantissant une durée de gravure ne dépassant pas une durée nécessaire minimale.
(JA)水晶基板2をエッチング加工することにより、脚部11,12に溝部11c,12cを備えた音叉型水晶ウェハ1Aを成形する際、エッチング領域の形状によってエッチング量が決定するエッチングストップ技術を利用し、溝部11c,12cの幅寸法を予め設定しておくことで溝部11c,12cの深さ寸法の加工精度の向上を図る。これにより、必要最短時間以上のエッチング時間を確保すれば設計寸法どおりの深さ寸法が得られる。
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: Japanese (JA)
Filing Language: Japanese (JA)