WIPO logo
Mobile | Deutsch | Español | Français | 日本語 | 한국어 | Português | Русский | 中文 | العربية |
PATENTSCOPE

Search International and National Patent Collections
World Intellectual Property Organization
Search
 
Browse
 
Translate
 
Options
 
News
 
Login
 
Help
 
Machine translation
1. (WO2004010457) METHOD AND APPARATUS FOR PRODUCING UNIFORM PROCESSING RATES
Latest bibliographic data on file with the International Bureau   

Pub. No.:    WO/2004/010457    International Application No.:    PCT/US2003/022206
Publication Date: 29.01.2004 International Filing Date: 17.07.2003
IPC:
H01J 37/32 (2006.01), H01Q 1/26 (2006.01), H01Q 11/12 (2006.01)
Applicants: LAM RESEARCH CORPORATION [US/US]; 4650 Cushing Parkway, Fremont, CA 94538 (US) (For All Designated States Except US).
HOWALD, Arthur, M. [US/US]; (US) (For US Only).
KUTHI, Andreas [US/US]; (US) (For US Only).
WILCOXSON, Mark, Henry [US/US]; (US) (For US Only).
BAILEY, Andrew, D., III [US/US]; (US) (For US Only)
Inventors: HOWALD, Arthur, M.; (US).
KUTHI, Andreas; (US).
WILCOXSON, Mark, Henry; (US).
BAILEY, Andrew, D., III; (US)
Agent: OLYNICK, Mary, R.; Beyer Weaver & Thomas, LLP, P.O Box 70250, Oakland, CA 94612-0250 (US)
Priority Data:
10/200,833 22.07.2002 US
Title (EN) METHOD AND APPARATUS FOR PRODUCING UNIFORM PROCESSING RATES
(FR) PROCEDE ET APPAREIL POUR PRODUIRE DES VITESSES DE TRAITEMENT UNIFORMES
Abstract: front page image
(EN)An antenna arrangement for generating an rf field distribution at a plasma generating region inside a chamber wall of a process chamber of a plasma processing apparatus is described. The antenna arrangement includes an rf inductive antenna to which an rf power supply can be connected to supply an rf current to generate a first rf field extending into the plasma generating region. A passive antenna is also provided which is inductively coupled to the rf inductive antenna and configured to generate a second rf field modifying the first rf field. The rf field distribution at the plasma generating region increases the processing uniformity of the processing apparatus compared to that in the absence of the passive antenna.
(FR)L'invention concerne un ensemble antenne pour produire une distribution de champ RF sur une région produisant du plasma à l'intérieur d'une paroi d'une chambre de traitement d'un appareil de traitement du plasma. Ledit ensemble antenne comprend une antenne inductive RF, à laquelle un dispositif d'alimentation RF peut être relié pour alimenter un premier champ RF s'étendant dans la région produisant du plasma. L'invention concerne également une antenne passive directement couplée à la première antenne inductive et configurée pour produire un second champ RF qui modifie le premier champ RF. La distribution de champ RF sur la région produisant du plasma améliore l'uniformité de traitement de l'appareil de traitement par rapport à celle produite en l'absence d'antenne passive.
Designated States: AE, AG, AL, AM, AT, AU, AZ, BA, BB, BG, BR, BY, BZ, CA, CH, CN, CO, CR, CU, CZ, DE, DK, DM, DZ, EC, EE, ES, FI, GB, GD, GE, GH, GM, HR, HU, ID, IL, IN, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, MA, MD, MG, MK, MN, MW, MX, MZ, NI, NO, NZ, OM, PG, PH, PL, PT, RO, RU, SC, SD, SE, SG, SK, SL, SY, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, YU, ZA, ZM, ZW.
African Regional Intellectual Property Organization (GH, GM, KE, LS, MW, MZ, SD, SL, SZ, TZ, UG, ZM, ZW)
Eurasian Patent Organization (AM, AZ, BY, KG, KZ, MD, RU, TJ, TM)
European Patent Office (AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HU, IE, IT, LU, MC, NL, PT, RO, SE, SI, SK, TR)
African Intellectual Property Organization (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, ML, MR, NE, SN, TD, TG).
Publication Language: English (EN)
Filing Language: English (EN)