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1. WO2004010455 - ION BEAM SOURCE WITH COATED ELECTRODE

Publication Number WO/2004/010455
Publication Date 29.01.2004
International Application No. PCT/US2003/022544
International Filing Date 21.07.2003
Chapter 2 Demand Filed 19.02.2004
IPC
B05D 5/12 2006.01
BPERFORMING OPERATIONS; TRANSPORTING
05SPRAYING OR ATOMISING IN GENERAL; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
DPROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
5Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
12to obtain a coating with specific electrical properties
C23C 14/34 2006.01
CCHEMISTRY; METALLURGY
23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
14Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
22characterised by the process of coating
34Sputtering
H01J 37/08 2006.01
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
08Ion sources; Ion guns
CPC
H01J 2237/083
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
2237Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
06Sources
083Beam forming
H01J 37/08
HELECTRICITY
01BASIC ELECTRIC ELEMENTS
JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
37Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
02Details
04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
08Ion sources; Ion guns
Applicants
  • GUARDIAN INDUSTRIES CORP. [US]/[US]
Inventors
  • VEERASAMY, Vijaysen, S.
  • PETRMICHL, Rudolph, Hugo
  • LUTEN, Henry, A., III
Agents
  • RHOA, Joseph, A.
Priority Data
10/200,55323.07.2002US
Publication Language English (EN)
Filing Language English (EN)
Designated States
Title
(EN) ION BEAM SOURCE WITH COATED ELECTRODE
(FR) SOURCE DE FAISCEAU IONIQUE A ELECTRODE(S) ENROBEE(S)
Abstract
(EN)
An ion source includes an anode (27) and/or cathode (29) which is/are coated with a conductive coating (40). The coating has a sputtering yield less than that of an uncoated anode and/or cathode, so that erosion of the resulting anode ad/or cathode in the source is reduced during source operation. Example coating materials for the anode and/or cathode of the ion beam source include metal borides including but not limited to TiB.
(FR)
La présente invention concerne une source d'ions qui comprend une anode et/ou une cathode qui est/sont enrobée(s) d'une couche conductrice. La couche d'enrobage présente un niveau d'érosion superficielle inférieur à celui d'une anode et/ou cathode non enrobée, de façon que l'érosion de l'anode et/ou cathode obtenue dans la source est réduite pendant le fonctionnement de la source. Des matériaux d'enrobage exemplaires de l'anode et/ou la cathode de la source de faisceau ionique comprennent des borures de métaux comprenant, de manière non limitative, le TiB2 et le ZrB2.
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